Proton irradiation-induced dark current in 4T CMOS active pixel sensor: Experiment and modeling

IF 1.4 3区 物理与天体物理 Q3 INSTRUMENTS & INSTRUMENTATION
Fang Liu, Tao Wang, Huan He, Zhigang Peng, Pei Li, Tan Shi, Pingan Zhou, Chuanhao Chen, Chaohui He, Hang Zang
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Abstract

The investigation of displacement damage mechanisms in CMOS image sensors (CISs) is important for enhancing radiation hardness. In this paper, the generation and annealing effects of irradiation induced dark current are investigated through the combined proton irradiation and a multiscale simulation model. A 0.13-μm CMOS image sensor was irradiated with 12 MeV protons at fluences ranging from 1×1011 cm−2 to 2×1012 cm−2. Experimental results on dark current distributions highlight the combined effect of ionization damage and displacement damage after proton irradiation. A reduction of approximately 40 % in the mean dark current was observed during the initial three days of room temperature annealing. The kinetic Monte Carlo (KMC) simulation results indicate that the observed changes in dark current after prolonged annealing may be associated with a reduction of divacancies. These results are highly valuable for understanding the key mechanisms of the displacement damage and predicting performance degradation of irradiated CISs.
4T CMOS有源像素传感器中质子辐照诱导暗电流:实验与建模
研究CMOS图像传感器的位移损伤机理对提高其辐射硬度具有重要意义。本文通过质子辐照和多尺度模拟模型的结合,研究了辐照诱导暗电流的产生和退火效应。用12 MeV质子辐照0.13 μm CMOS图像传感器,辐照量为1×1011 cm−2 ~ 2×1012 cm−2。暗电流分布的实验结果突出了质子辐照后电离损伤和位移损伤的综合作用。在室温退火的前三天,观察到平均暗电流减少了大约40%。动力学蒙特卡罗(KMC)模拟结果表明,观察到的长时间退火后暗电流的变化可能与空位的减少有关。这些结果对于理解辐照CISs位移损伤的关键机理和预测其性能退化具有重要价值。
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来源期刊
CiteScore
2.80
自引率
7.70%
发文量
231
审稿时长
1.9 months
期刊介绍: Section B of Nuclear Instruments and Methods in Physics Research covers all aspects of the interaction of energetic beams with atoms, molecules and aggregate forms of matter. This includes ion beam analysis and ion beam modification of materials as well as basic data of importance for these studies. Topics of general interest include: atomic collisions in solids, particle channelling, all aspects of collision cascades, the modification of materials by energetic beams, ion implantation, irradiation - induced changes in materials, the physics and chemistry of beam interactions and the analysis of materials by all forms of energetic radiation. Modification by ion, laser and electron beams for the study of electronic materials, metals, ceramics, insulators, polymers and other important and new materials systems are included. Related studies, such as the application of ion beam analysis to biological, archaeological and geological samples as well as applications to solve problems in planetary science are also welcome. Energetic beams of interest include atomic and molecular ions, neutrons, positrons and muons, plasmas directed at surfaces, electron and photon beams, including laser treated surfaces and studies of solids by photon radiation from rotating anodes, synchrotrons, etc. In addition, the interaction between various forms of radiation and radiation-induced deposition processes are relevant.
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