Electron Coulomb repulsion versus impurity potential in disordered interacting systems

IF 2.5 4区 工程技术 Q3 ENGINEERING, ELECTRICAL & ELECTRONIC
Poorya Rabi-beigi, Rostam Moradian, Chinedu E. Ekuma
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引用次数: 0

Abstract

In this work, we introduce a new calculation method for disordered interacting electron systems. Since both the Coulomb repulsion and impurity potential modify the system band structure and hence its electronic properties, we investigate the competition between the electrons’ Coulomb repulsion potential and the impurity potential in changing the system band structure and its phase diagram. This method is applied to a disordered interacting electron square lattice system. The advantages of our method include eliminating the influence of random numbers in the Monte Carlo process and avoiding computational errors caused by repeated evaluations of Green’s function. For comparison of the advantages of our multi-site versus single-site methods, the renormalized band structure in the dynamical mean field theory (DMFT) plus coherent potential approximation (CPA) and the multi-site beyond effective medium supercell approximation (BEMSCA) are calculated. By using realistic calculated band structures, we investigate the competition between the Coulomb interaction and impurity potential parameters in the system phase diagram. Our calculated renormalized band structures show that the (\(\delta = 4.0t\), u = 0) point is a point at which band splitting is observed. By increasing the Coulomb repulsion, u, the energy gap between split bands reduces and completely disappears at uc1 = 3.11t and uc1 = 2.7t for the DMFT+CPA and four-site BEMSCA, respectively. For Coulomb repulsion strengths greater than uc1, u > uc1, the two bands merge into a single energy band, hence creating a paramagnetic metallic state. The metallic state occurs in a region where the strength of the Coulomb interaction is large enough to overcome the disorder potential effects. This metallic state extends until uc2 = 13.99t and uc2 = 8.15t for the DMFT+CPA and four sites for BEMSCA, respectively. These metallic states are sandwiched between two insulator states, band insulation u < uc1 and Mott insulation u > uc2. Another important result is the creation of a flat valence band at the Fermi energy for special Coulomb repulsion strengths. The flattening of the valence band can be considered as a mechanism contributing to the high-temperature superconductivity in ceramic superconductors.

无序相互作用系统中的电子库仑排斥与杂质势
本文介绍了一种新的无序相互作用电子系统的计算方法。由于库仑斥力和杂质势都改变了系统的能带结构,从而改变了系统的电子性质,因此我们研究了电子的库仑斥力和杂质势在改变系统能带结构及其相图方面的竞争。将该方法应用于无序相互作用电子方阵体系。该方法的优点是消除了蒙特卡罗过程中随机数的影响,避免了由于格林函数的重复求值而产生的计算误差。为了比较我们的多点方法与单点方法的优势,计算了动态平均场理论(DMFT)加相干势近似(CPA)和多点超有效介质超级单体近似(BEMSCA)中的重归一化带结构。通过实际计算的能带结构,我们研究了系统相图中库仑相互作用和杂质势参数之间的竞争关系。我们计算的重归一化能带结构表明(\(\delta = 4.0t\), u = 0)点是观察到能带分裂的点。通过增加库仑斥力u, DMFT+CPA和四位点BEMSCA在uc1 = 3.11t和uc1 = 2.7t时,分裂带间的能隙减小并完全消失。当库仑斥力大于uc1, u &gt; uc1时,两个能带合并为一个能带,从而形成顺磁性金属态。金属态发生在库仑相互作用强度大到足以克服无序势效应的区域。DMFT+CPA和BEMSCA分别延伸到uc2 = 13.99t和uc2 = 8.15t。这些金属状态夹在两种绝缘体状态之间,带绝缘u &lt; uc1和莫特绝缘u &gt; uc2。另一个重要的结果是在特殊库仑排斥力的费米能量处创造了一个平坦的价带。价带的平坦化可以被认为是陶瓷超导体高温超导的一种机制。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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来源期刊
Journal of Computational Electronics
Journal of Computational Electronics ENGINEERING, ELECTRICAL & ELECTRONIC-PHYSICS, APPLIED
CiteScore
4.50
自引率
4.80%
发文量
142
审稿时长
>12 weeks
期刊介绍: he Journal of Computational Electronics brings together research on all aspects of modeling and simulation of modern electronics. This includes optical, electronic, mechanical, and quantum mechanical aspects, as well as research on the underlying mathematical algorithms and computational details. The related areas of energy conversion/storage and of molecular and biological systems, in which the thrust is on the charge transport, electronic, mechanical, and optical properties, are also covered. In particular, we encourage manuscripts dealing with device simulation; with optical and optoelectronic systems and photonics; with energy storage (e.g. batteries, fuel cells) and harvesting (e.g. photovoltaic), with simulation of circuits, VLSI layout, logic and architecture (based on, for example, CMOS devices, quantum-cellular automata, QBITs, or single-electron transistors); with electromagnetic simulations (such as microwave electronics and components); or with molecular and biological systems. However, in all these cases, the submitted manuscripts should explicitly address the electronic properties of the relevant systems, materials, or devices and/or present novel contributions to the physical models, computational strategies, or numerical algorithms.
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