Jong Min Joo, Jun Young Choi, Dong Hyun Kim, Jin Suk Oh, Min Su Kang, Ji Eun Park, Sim Hun Yuk, Tae Geun Kim
{"title":"Improved reliability of Si-doped GeS-based selector-only memory via homopolar bond suppression and enhanced memory window","authors":"Jong Min Joo, Jun Young Choi, Dong Hyun Kim, Jin Suk Oh, Min Su Kang, Ji Eun Park, Sim Hun Yuk, Tae Geun Kim","doi":"10.1016/j.jmst.2025.09.005","DOIUrl":null,"url":null,"abstract":"Selector-only memory (SOM) devices have emerged as promising candidates for next-generation memory technologies. Their unique architecture enables cross-point array integration without requiring an external selector, while offering faster operation speeds and lower power consumption compared to conventional storage-class memory (SCM) devices. Despite these advantages, amorphous chalcogenide-based SOM devices face several challenges that hinder commercialization, including poor thermal stability, threshold voltage (<em>V</em><sub>th</sub>) drift, a limited memory window, and degradation in electrical performance. In this study, we address these limitations by systematically investigating charge trapping phenomena based on the Poole–Frenkel conduction mechanism. We also compare the material properties of previously reported chalcogenide compounds to guide the design of a high-performance SOM device. GeS was selected as the active material due to its higher bonding energy and lower trap density compared to GeTe and GeSe. To further enhance device performance, Si doping was employed to suppress unstable S–S homopolar bonds, thereby reinforcing the amorphous network and improving both endurance and the memory window. The resulting Si-doped GeS-based SOM device exhibited excellent endurance (> 2 × 10<sup>8</sup> cycles) and long retention times (> 10<sup>7</sup> s), attributed to improved structural integrity through strong Si–S covalent bonding. The reduction in trap density also led to an increased threshold voltage in the RESET state, enabling a wide memory window (Δ<em>V</em><sub>th</sub> ≈ 2.3 V). Moreover, by modulating pulse width (50–500 ns), we successfully demonstrated 2-bit multi-level cell (MLC) operation. These findings highlight that the Si-doped GeS-based SOM device combines low power consumption (≈ 50 pJ/bit), fast switching speed (≈ 100 ns), high endurance, and a wide memory window. This positions it as a strong candidate for next-generation compute express link-based SCM applications.","PeriodicalId":16154,"journal":{"name":"Journal of Materials Science & Technology","volume":"9 1","pages":""},"PeriodicalIF":14.3000,"publicationDate":"2025-09-10","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Journal of Materials Science & Technology","FirstCategoryId":"88","ListUrlMain":"https://doi.org/10.1016/j.jmst.2025.09.005","RegionNum":1,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q1","JCRName":"MATERIALS SCIENCE, MULTIDISCIPLINARY","Score":null,"Total":0}
引用次数: 0
Abstract
Selector-only memory (SOM) devices have emerged as promising candidates for next-generation memory technologies. Their unique architecture enables cross-point array integration without requiring an external selector, while offering faster operation speeds and lower power consumption compared to conventional storage-class memory (SCM) devices. Despite these advantages, amorphous chalcogenide-based SOM devices face several challenges that hinder commercialization, including poor thermal stability, threshold voltage (Vth) drift, a limited memory window, and degradation in electrical performance. In this study, we address these limitations by systematically investigating charge trapping phenomena based on the Poole–Frenkel conduction mechanism. We also compare the material properties of previously reported chalcogenide compounds to guide the design of a high-performance SOM device. GeS was selected as the active material due to its higher bonding energy and lower trap density compared to GeTe and GeSe. To further enhance device performance, Si doping was employed to suppress unstable S–S homopolar bonds, thereby reinforcing the amorphous network and improving both endurance and the memory window. The resulting Si-doped GeS-based SOM device exhibited excellent endurance (> 2 × 108 cycles) and long retention times (> 107 s), attributed to improved structural integrity through strong Si–S covalent bonding. The reduction in trap density also led to an increased threshold voltage in the RESET state, enabling a wide memory window (ΔVth ≈ 2.3 V). Moreover, by modulating pulse width (50–500 ns), we successfully demonstrated 2-bit multi-level cell (MLC) operation. These findings highlight that the Si-doped GeS-based SOM device combines low power consumption (≈ 50 pJ/bit), fast switching speed (≈ 100 ns), high endurance, and a wide memory window. This positions it as a strong candidate for next-generation compute express link-based SCM applications.
期刊介绍:
Journal of Materials Science & Technology strives to promote global collaboration in the field of materials science and technology. It primarily publishes original research papers, invited review articles, letters, research notes, and summaries of scientific achievements. The journal covers a wide range of materials science and technology topics, including metallic materials, inorganic nonmetallic materials, and composite materials.