Hongwei Gao, Xavier X. Chia, Ruitao Zheng, Sin Heng Lim, Dawn T. H. Tan
{"title":"Realizing Multispectral Fabry–Perot Structural Color Filters Based on Optical Nanostructures on a Complementary Metal Oxide Semiconductor Chip","authors":"Hongwei Gao, Xavier X. Chia, Ruitao Zheng, Sin Heng Lim, Dawn T. H. Tan","doi":"10.1002/adpr.70076","DOIUrl":null,"url":null,"abstract":"<p><b>Transmission Filters</b></p><p>In article number 2500057, Dawn T. H. Tan and co-workers develop a CMOS-compatible transmission structural color filter implemented using subwavelength nanostructures and validated through design, simulation, and experiments. Tunable peak wavelengths are achieved lithographically within a single dielectric layer, avoiding thickness variations. The proposed nanostructure yields 10–30 nm spectral resolution and ~70% efficiency, offering efficient, simplified, cost-effective multispectral filters.\n <figure>\n <div><picture>\n <source></source></picture><p></p>\n </div>\n </figure></p>","PeriodicalId":7263,"journal":{"name":"Advanced Photonics Research","volume":"6 9","pages":""},"PeriodicalIF":3.9000,"publicationDate":"2025-09-08","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://advanced.onlinelibrary.wiley.com/doi/epdf/10.1002/adpr.70076","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Advanced Photonics Research","FirstCategoryId":"1085","ListUrlMain":"https://advanced.onlinelibrary.wiley.com/doi/10.1002/adpr.70076","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q2","JCRName":"MATERIALS SCIENCE, MULTIDISCIPLINARY","Score":null,"Total":0}
引用次数: 0
Abstract
Transmission Filters
In article number 2500057, Dawn T. H. Tan and co-workers develop a CMOS-compatible transmission structural color filter implemented using subwavelength nanostructures and validated through design, simulation, and experiments. Tunable peak wavelengths are achieved lithographically within a single dielectric layer, avoiding thickness variations. The proposed nanostructure yields 10–30 nm spectral resolution and ~70% efficiency, offering efficient, simplified, cost-effective multispectral filters.