Tailoring Ti3C2Tx MXene multilayers for biomaterial integration: synthesis, characterization, and cytotoxicity

IF 4.6 3区 材料科学 Q2 MATERIALS SCIENCE, MULTIDISCIPLINARY
Pasa Yaman , Bedri Onur Kucukyildirim
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引用次数: 0

Abstract

This study examines the biomedical potential of Ti3C2Tx MXene multilayers, which are synthesized from the Ti3AlC2 MAX phase using different wet chemical etching methods: HF, LiF/HCl, and NaF/HCl. The effects of each etchant on the morphology, interlayer spacing, surface terminations, and defect structures are thoroughly analyzed using techniques such as XRD, FESEM, EDS, FTIR, and Raman spectroscopy. Cytotoxicity tests based on assays using L929 fibroblast cells demonstrate a strong relationship between surface groups and biocompatibility. Among the tested variants, NaF/HCl-etched MXenes showed smoother multilayers with less structural damage, optimized surface terminations, and lower toxicity to cells compared to HF-etched multilayers, which exhibited more structural damage, surface oxidation, and higher toxicity. These results highlight the importance of selecting the right etching method in tailoring MXene multilayers for use in ceramic-based biomedical scaffolds and implantable devices, offering guidance for future development of biocompatible materials.

Abstract Image

剪裁Ti3C2Tx MXene多层生物材料集成:合成,表征,和细胞毒性
本研究考察了Ti3AlC2 MAX相制备Ti3C2Tx MXene多层膜的生物医学潜力,采用不同的湿化学蚀刻方法:HF、LiF/HCl和NaF/HCl。利用XRD、FESEM、EDS、FTIR和拉曼光谱等技术,深入分析了每种蚀刻剂对形貌、层间距、表面末端和缺陷结构的影响。基于L929成纤维细胞测定的细胞毒性试验表明,表面基团与生物相容性之间存在很强的关系。在测试的变体中,与表现出更多结构损伤、表面氧化和更高毒性的hf蚀刻多层膜相比,NaF/ cl蚀刻的MXenes多层膜更光滑,结构损伤更小,表面末端优化,对细胞的毒性更低。这些结果强调了选择正确的蚀刻方法在定制用于陶瓷基生物医学支架和植入式装置的MXene多层材料中的重要性,为未来生物相容性材料的发展提供了指导。
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来源期刊
Materials Science and Engineering: B
Materials Science and Engineering: B 工程技术-材料科学:综合
CiteScore
5.60
自引率
2.80%
发文量
481
审稿时长
3.5 months
期刊介绍: The journal provides an international medium for the publication of theoretical and experimental studies and reviews related to the electronic, electrochemical, ionic, magnetic, optical, and biosensing properties of solid state materials in bulk, thin film and particulate forms. Papers dealing with synthesis, processing, characterization, structure, physical properties and computational aspects of nano-crystalline, crystalline, amorphous and glassy forms of ceramics, semiconductors, layered insertion compounds, low-dimensional compounds and systems, fast-ion conductors, polymers and dielectrics are viewed as suitable for publication. Articles focused on nano-structured aspects of these advanced solid-state materials will also be considered suitable.
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