Sulphurization of In thin films using Bi2S3 and Sb2S3 and self-organized fabrication of In2S3 nanodots by electrochemical etching

IF 3.5 3区 化学 Q2 CHEMISTRY, INORGANIC & NUCLEAR
A. Aleksandrova , T. Barlas , Z. Zhuchenko , C. Golz , M. Hanke , A. Trampert , D. Spallek , C. Herrmann , W.T. Masselink , Y. Takagaki
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Abstract

Thin In films are exposed to the vapor of Sb2S3 and Bi2S3 at high temperatures for sulphurization. The release of Sb and Bi in the reaction alters the properties of the synthesized β-In2S3 films by introducing surfactant effects. For using Sb2S3, the texture of the films is not sensitive to the sulphurization temperature. A morphological change takes place at a critical thickness of the In films of about 50 nm. Below the critical thickness, the constitution of the synthesized films is grain-like with a uniform grain size of about 100 nm. Above the critical thickness, the granularity looses the characteristic size as if the films consist of fine particles. Bumps emerge in the latter situation due to the surface instability of the In melt against the volume expansion in the solidification. The grains in the films prepared using Bi2S3 are submicron-sized and loosely connected to each other regardless of the thickness. The films are hence homogeneous with exhibiting no surface bulging. More importantly, hexagon-shaped disks are interwoven in the In2S3 films for a range of the synthesis temperature. The two-dimensional material is suggested to be an unknown compound having an approximate composition of Bi9In13S18, where Bi is incorporated in the alloy when the Bi production is significantly faster than its loss by the evaporation. The formation of the ternary alloy in the present case evidences that the elastic energy associated with the lattice coincidence to the substrate influences the inclusion of Bi in the sulfide. Furthermore, nanodots are observed to be produced in a self-organized fashion in the electrochemical etching of the In2S3 films.

Abstract Image

用Bi2S3和Sb2S3对In薄膜进行硫化及电化学刻蚀制备In2S3纳米点
In薄膜在高温下暴露于Sb2S3和Bi2S3的蒸气中进行硫化。反应中Sb和Bi的释放通过引入表面活性剂效应改变了合成的β-In2S3薄膜的性能。使用Sb2S3时,膜的织构对硫化温度不敏感。在铟薄膜的临界厚度约为50纳米时发生形态变化。在临界厚度以下,合成薄膜的结构呈晶粒状,晶粒尺寸均匀,约为100nm。在临界厚度以上,粒度失去了特征尺寸,就好像薄膜由细颗粒组成一样。在后一种情况下,由于in熔体的表面不稳定,不利于凝固过程中的体积膨胀,因此会出现凸起。使用Bi2S3制备的薄膜中的颗粒尺寸为亚微米级,并且与厚度无关,彼此之间连接松散。因此,薄膜是均匀的,没有表面膨胀。更重要的是,在一定的合成温度范围内,六边形圆盘交织在In2S3薄膜中。二维材料被认为是一种未知的化合物,其成分近似为Bi9In13S18,当Bi的产生明显快于其蒸发损失时,Bi被掺入合金中。本案例中三元合金的形成证明,与基体晶格重合相关的弹性能影响了铋在硫化物中的包合。此外,在电化学刻蚀In2S3薄膜的过程中,观察到纳米点以自组织的方式产生。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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来源期刊
Journal of Solid State Chemistry
Journal of Solid State Chemistry 化学-无机化学与核化学
CiteScore
6.00
自引率
9.10%
发文量
848
审稿时长
25 days
期刊介绍: Covering major developments in the field of solid state chemistry and related areas such as ceramics and amorphous materials, the Journal of Solid State Chemistry features studies of chemical, structural, thermodynamic, electronic, magnetic, and optical properties and processes in solids.
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