Thermally stimulated recombination processes in the YPO4:Bi system

IF 4.2 3区 材料科学 Q2 MATERIALS SCIENCE, MULTIDISCIPLINARY
I.N. Ogorodnikov, Yu.A. Kuznetsova, D.V. Raikov
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引用次数: 0

Abstract

The 10-trap model for describing thermally stimulated recombination processes in the YPO4:Bi system was developed. In addition to the six Bi-related centers, the model includes two shallow unidentified traps and two deep unidentified traps. The model was parameterized (FOM = 5.5 %) using previous experimental data on spectrally selective thermoluminescence (TL) recorded monitoring emission at 3.6 and 5.1 eV. For each trap, the best-fit parameters were obtained: activation energy, frequency factor, trapping and recombination factors; signs of delocalizing charge carriers. The origin of the observed TL glow peaks and the main channels of recombination processes leading to luminescence at 3.6 and 5.1 eV were revealed. The parameterized model was applied to the analysis of the origin of long-lasting afterglow in the YPO4:Bi system. It was found that at room temperature the first relatively fast component of the afterglow decay kinetics is caused by detrapping charge carriers from shallow traps, manifesting itself as a TL glow peak closest to room temperature: trapped electron center with TL glow peak maximum at about 340 K, which is caused predominantly by electron recombination luminescence; the temperature dependence of the fast component of the afterglow decay kinetics was studied and the origin of the apparent wide TL glow peaks III, revealed earlier by processing the experimental data on YPO4:Bi, was established. The origin of the second slow component of the afterglow decay kinetics is attributed to processes beyond the scope of this model; only the final stages of the recombination processes that cause the slow afterglow component are discussed.
YPO4:Bi体系的热刺激重组过程
建立了描述YPO4:Bi体系热激复合过程的10阱模型。除了六个与bi相关的中心外,该模型还包括两个浅层未识别圈闭和两个深层未识别圈闭。利用光谱选择性热释光(TL)在3.6和5.1 eV下记录的监测发射的实验数据对模型进行参数化(FOM = 5.5%)。对于每个陷阱,得到了最适合的参数:活化能、频率因子、捕获因子和重组因子;载流子离地的迹象。揭示了所观察到的TL发光峰的来源以及导致3.6和5.1 eV发光的复合过程的主要通道。将参数化模型应用于YPO4:Bi系统中持久余辉的成因分析。结果表明:在室温下,余辉衰减动力学的第一个相对较快的组分是由浅层陷阱中载流子的脱捕引起的,表现为最接近室温的TL发光峰:被捕获的电子中心在340 K左右出现最大的TL发光峰,主要是由电子复合发光引起的;研究了余辉衰减动力学中快速组分的温度依赖性,并建立了先前处理YPO4:Bi实验数据所揭示的宽TL发光峰III的来源。余辉衰减动力学的第二个慢速组分的起源归因于超出该模型范围的过程;本文只讨论了引起缓慢余辉成分的复合过程的最后阶段。
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来源期刊
Optical Materials
Optical Materials 工程技术-材料科学:综合
CiteScore
6.60
自引率
12.80%
发文量
1265
审稿时长
38 days
期刊介绍: Optical Materials has an open access mirror journal Optical Materials: X, sharing the same aims and scope, editorial team, submission system and rigorous peer review. The purpose of Optical Materials is to provide a means of communication and technology transfer between researchers who are interested in materials for potential device applications. The journal publishes original papers and review articles on the design, synthesis, characterisation and applications of optical materials. OPTICAL MATERIALS focuses on: • Optical Properties of Material Systems; • The Materials Aspects of Optical Phenomena; • The Materials Aspects of Devices and Applications. Authors can submit separate research elements describing their data to Data in Brief and methods to Methods X.
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