Optimization of interface electrostatics in T-gate GaN HEMTs for advanced pH sensing applications

IF 4.6 3区 材料科学 Q2 MATERIALS SCIENCE, MULTIDISCIPLINARY
Nudrat Sufiyan , Aasif Mohammad Bhat , Arathy Varghese , Anup Kumar Sharma
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引用次数: 0

Abstract

This work investigates a novel T-gate AlGaN/AlN/GaN HEMT designed as a pH sensor by incorporating electrolyte solution in the cavities on both sides of the gate. The sensor’s performance is evaluated based on the variation in the interface charge density corresponding to the change in electrolyte solution pH. This study examines the impact of varying pH solutions on the device’s characteristics, specifically focusing on threshold voltage sensitivity and drain current sensitivity. Furthermore, the gate voltage was optimized to achieve maximum transconductance (gm) and, consequently, the highest sensitivity to pH changes. The linearity of the device was evaluated using VIP2, VIP3, IIP3, and IMD3 analyses. Notably, the proposed sensor exhibits an average threshold voltage sensitivity of 180 mV/pH, significantly exceeding the Nernstian limit (59 mV/pH), alongside a current sensitivity of 70.21 mA/mm.pH. These results underscore the potential of this recessed T-gate AlGaN/AlN/GaN HEMT as a compelling alternative for advanced pH sensing applications.
用于高级pH传感应用的t栅GaN hemt界面静电优化
本文研究了一种新型的t型栅极AlGaN/AlN/GaN HEMT,通过在栅极两侧的空腔中加入电解质溶液来设计pH传感器。传感器的性能是根据与电解质溶液pH变化相对应的界面电荷密度变化来评估的。本研究考察了不同pH溶液对器件特性的影响,特别关注阈值电压灵敏度和漏极电流灵敏度。此外,栅极电压经过优化以实现最大的跨导(gm),因此对pH变化的灵敏度最高。使用VIP2、VIP3、IIP3和IMD3分析评估器件的线性度。值得注意的是,该传感器的平均阈值电压灵敏度为180 mV/pH,大大超过了Nernstian极限(59 mV/pH),同时电流灵敏度为70.21 mA/mm.pH。这些结果强调了这种嵌入式t栅AlGaN/AlN/GaN HEMT作为先进pH传感应用的引人注目的替代方案的潜力。
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来源期刊
Materials Science and Engineering: B
Materials Science and Engineering: B 工程技术-材料科学:综合
CiteScore
5.60
自引率
2.80%
发文量
481
审稿时长
3.5 months
期刊介绍: The journal provides an international medium for the publication of theoretical and experimental studies and reviews related to the electronic, electrochemical, ionic, magnetic, optical, and biosensing properties of solid state materials in bulk, thin film and particulate forms. Papers dealing with synthesis, processing, characterization, structure, physical properties and computational aspects of nano-crystalline, crystalline, amorphous and glassy forms of ceramics, semiconductors, layered insertion compounds, low-dimensional compounds and systems, fast-ion conductors, polymers and dielectrics are viewed as suitable for publication. Articles focused on nano-structured aspects of these advanced solid-state materials will also be considered suitable.
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