Effect of Deposition Modes on Micromechanical Properties of Nanostructured TiAlSiN and TiAlSiCN Coatings

IF 0.7 Q3 Engineering
S. V. Konstantinov, F. F. Komarov, I. V. Chizhov, V. A. Zaikov
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引用次数: 0

Abstract

Nanostructured nitride TiAlSiN and carbonitride TiAlSiCN coatings were formed by reactive magnetron sputtering on various types of substrates. Elemental composition was studied by energy dispersive X-ray spectroscopy (EDX) as well as structure by X-ray diffraction and micromechanical properties by nanoindentation. It was found that the formed coatings have a single-phase structure, which is a disordered solid solution with a face-centered cubic lattice. It was detected that a decrease in the degree of reactivity α from α = 0.605 to α = 0.421 leads to an increase in the deposition rate of nitride TiAlSiN and carbonitride TiAlSiСN coatings on silicon substrates by 200–300%. The hardness of the formed coatings varies in the range H = 28.74–48.99 GPa and Young’s modulus is E = 324.97–506.12 GPa. TiAlSiN and TiAlSiCN coatings demonstrate high indices of impact strength H/E * = 0.07–0.12 and resistance to plastic deformation H3/E *2 = 0.13–0.72. The micromechanical properties of the formed nanostructured nitride and carbonitride coatings TiAlSiN and TiAlSiCN are promising for use in space technologies.

Abstract Image

Abstract Image

沉积方式对纳米结构TiAlSiN和TiAlSiCN涂层微观力学性能的影响
采用反应磁控溅射技术在不同类型的衬底上制备了纳米氮化TiAlSiCN和碳氮化TiAlSiCN涂层。利用能量色散x射线光谱(EDX)研究了元素组成,x射线衍射研究了结构,纳米压痕研究了微观力学性能。结果表明,形成的涂层为一种具有面心立方晶格的无序固溶体,为单相结构。结果表明,当反应度α从α = 0.605降低到α = 0.421时,氮化TiAlSiN和碳氮化TiAlSiСN涂层在硅基体上的沉积速率提高了200 ~ 300%。形成的涂层硬度为H = 28.74 ~ 48.99 GPa,杨氏模量为E = 324.97 ~ 506.12 GPa。TiAlSiN和TiAlSiCN涂层具有较高的冲击强度指标H/E * = 0.07-0.12,抗塑性变形指标H3/E *2 = 0.13-0.72。形成的纳米结构氮化物和碳氮化物涂层TiAlSiN和TiAlSiCN的微观力学性能在空间技术中有很好的应用前景。
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来源期刊
Surface Engineering and Applied Electrochemistry
Surface Engineering and Applied Electrochemistry Engineering-Industrial and Manufacturing Engineering
CiteScore
1.60
自引率
22.20%
发文量
54
期刊介绍: Surface Engineering and Applied Electrochemistry is a journal that publishes original and review articles on theory and applications of electroerosion and electrochemical methods for the treatment of materials; physical and chemical methods for the preparation of macro-, micro-, and nanomaterials and their properties; electrical processes in engineering, chemistry, and methods for the processing of biological products and food; and application electromagnetic fields in biological systems.
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