Effect of V-Pits Coverage Optoelectronic Characteristics in Green GaN-Based Mini-Light-Emitting Diodes Grown by MOCVD

Electron Pub Date : 2025-08-22 DOI:10.1002/elt2.70014
Shenglong Wei, Xiuheng Zhou, Xiaofeng Chen, Rongkun Chen, Feifan Ma, Yihong Chen, Vedaste Uwihoreye, Freddy E. Oropeza, Yongxing Liu, Likai Xun, Haihui Xin, Kaiyi Wu, Xitian Liu, Yongzhou Zhao, Kelvin H. L. Zhang
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Abstract

V-pits have been intensively studied for their role in light-emitting diodes (LEDs). The coverage of V-pits in InGaN/GaN multi-quantum wells (MQWs) is critical for suppressing leakage path through electron blocking layer (EBL). In this study, we have investigated the coverage of V-pits in green mini-LEDs modulated via growth parameters optimization and systematically analyzed the characteristics of the photoelectric properties associated with V-pits coverage on device. Elevated temperatures and pressures result in enhanced adatoms migration, which can achieve a coverage up to 98.8% of V-pits, improving the crystal quality due to stable surface. Electrical characterization reveals that although high-coverage devices exhibit suppressed leakage current, their peak external quantum efficiency (EQE) decreases, more seriously spectral blue shift and operating voltage increase due to compromised hole transport uniformity. Intriguingly, intermediate-coverage samples demonstrate superior breakdown voltage characteristics. Current–voltage curve analysis shows the ideality factor increases from 1.8 to 2.5 with improved coverage, indicating aggravated Shockley–Read–Hall (SRH) recombination with covered V-pits.

Abstract Image

MOCVD生长绿色gan基微型发光二极管v坑覆盖光电特性的影响
v坑因其在发光二极管(led)中的作用而受到广泛的研究。InGaN/GaN多量子阱(mqw)中v坑的覆盖对于抑制电子阻挡层(EBL)泄漏通路至关重要。在本研究中,我们研究了通过生长参数优化调制的绿色微型led的v坑覆盖率,并系统地分析了与器件上v坑覆盖率相关的光电特性特征。升高的温度和压力导致adatoms迁移增强,可以实现高达98.8%的v坑覆盖率,由于表面稳定,提高了晶体质量。电学表征表明,尽管高覆盖器件的漏电流受到抑制,但由于空穴输运均匀性受损,其峰值外量子效率(EQE)降低,更严重的是光谱蓝移和工作电压升高。有趣的是,中等覆盖率的样品表现出优越的击穿电压特性。电流-电压曲线分析表明,随着覆盖范围的扩大,理想因子从1.8增加到2.5,表明覆盖v坑后SRH复合加剧。
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