Fabrication of wire-grid polarizer with glass molded nanograting structure

IF 2 Q3 ENGINEERING, MANUFACTURING
Chengjun Jin , Young Kyu Kim , Hyungjum Jang , Xun Lu , Seok-min Kim
{"title":"Fabrication of wire-grid polarizer with glass molded nanograting structure","authors":"Chengjun Jin ,&nbsp;Young Kyu Kim ,&nbsp;Hyungjum Jang ,&nbsp;Xun Lu ,&nbsp;Seok-min Kim","doi":"10.1016/j.mfglet.2025.06.028","DOIUrl":null,"url":null,"abstract":"<div><div>Wire grid polarizers (WGPs) are essential in photonic applications such as laser optical systems, imaging systems, and displays due to their high polarization efficiency and durability. Conventional WGPs fabricated on polymer substrates face limitations in optical transmittance, mechanical stability, and thermal durability. This study introduces a cost-effective and scalable method for fabricating WGPs on glass nanograting structures using Vitreous Carbon (VC) molds and oblique angle deposition (OAD) of aluminum. The proposed process addresses the shortcomings of polymer-based WGPs while enabling large-area production. The VC mold was fabricated through a multi-step replication and carbonization process. A silicon master with nanograting features (500 nm pitch, 250 nm height, 50 % duty cycle) was prepared using reactive ion etching and KrF laser photolithography. A polymer template was replicated via UV imprinting, and a furan precursor was replicated from the polymer template through a thermal curing process. A VC mold with a nanograting cavity (400 nm pitch, 140 nm height) was obtained by a carbonization process at 1000 °C in a nitrogen-purged environment. Glass nanogratings were then formed by molding soda-lime glass at 730 °C under 1.84 MPa, with SEM analysis confirming successful nanoscale replication. An aluminum layer was deposited on the glass nanograting using the OAD process, with optimized flux angles (&lt;70°) to minimize sidewall deposition and prevent isolated nanorods. The fabricated WGP exhibited a transverse-magnetic wave transmittance of over 40 % and an extinction ratio of ∼40 at 600 nm, which is similar to the simulation results for the glass WGP model with slight sidewall deposition. Although the pitch of the fabricated WGPs were not suitable for visible light applications, this study demonstrates the feasibility of WGPs with directly molded glass nanograting structures, offering advantages in cost, scalability, and durability. The proposed method is promising for advancing photonic applications.</div></div>","PeriodicalId":38186,"journal":{"name":"Manufacturing Letters","volume":"44 ","pages":"Pages 233-236"},"PeriodicalIF":2.0000,"publicationDate":"2025-08-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Manufacturing Letters","FirstCategoryId":"1085","ListUrlMain":"https://www.sciencedirect.com/science/article/pii/S2213846325000549","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q3","JCRName":"ENGINEERING, MANUFACTURING","Score":null,"Total":0}
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Abstract

Wire grid polarizers (WGPs) are essential in photonic applications such as laser optical systems, imaging systems, and displays due to their high polarization efficiency and durability. Conventional WGPs fabricated on polymer substrates face limitations in optical transmittance, mechanical stability, and thermal durability. This study introduces a cost-effective and scalable method for fabricating WGPs on glass nanograting structures using Vitreous Carbon (VC) molds and oblique angle deposition (OAD) of aluminum. The proposed process addresses the shortcomings of polymer-based WGPs while enabling large-area production. The VC mold was fabricated through a multi-step replication and carbonization process. A silicon master with nanograting features (500 nm pitch, 250 nm height, 50 % duty cycle) was prepared using reactive ion etching and KrF laser photolithography. A polymer template was replicated via UV imprinting, and a furan precursor was replicated from the polymer template through a thermal curing process. A VC mold with a nanograting cavity (400 nm pitch, 140 nm height) was obtained by a carbonization process at 1000 °C in a nitrogen-purged environment. Glass nanogratings were then formed by molding soda-lime glass at 730 °C under 1.84 MPa, with SEM analysis confirming successful nanoscale replication. An aluminum layer was deposited on the glass nanograting using the OAD process, with optimized flux angles (<70°) to minimize sidewall deposition and prevent isolated nanorods. The fabricated WGP exhibited a transverse-magnetic wave transmittance of over 40 % and an extinction ratio of ∼40 at 600 nm, which is similar to the simulation results for the glass WGP model with slight sidewall deposition. Although the pitch of the fabricated WGPs were not suitable for visible light applications, this study demonstrates the feasibility of WGPs with directly molded glass nanograting structures, offering advantages in cost, scalability, and durability. The proposed method is promising for advancing photonic applications.
玻璃模压纳米光栅结构线栅偏光片的制备
由于其高偏振效率和耐用性,线栅偏振器(WGPs)在激光光学系统、成像系统和显示等光子应用中至关重要。在聚合物基板上制造的传统WGPs在透光率、机械稳定性和热耐久性方面存在局限性。本研究介绍了一种在玻璃纳米光栅结构上使用玻璃体碳(VC)模具和铝的斜角沉积(OAD)制造WGPs的成本效益高且可扩展的方法。该工艺解决了聚合物基WGPs的缺点,同时实现了大面积生产。通过多步复制和碳化工艺制备了VC模具。采用反应离子刻蚀和KrF激光光刻技术制备了具有纳米光栅特征(500 nm间距,250 nm高度,50% %占空比)的硅母片。采用紫外印迹技术复制聚合物模板,并通过热固化工艺从聚合物模板中复制呋喃前驱体。在氮气净化环境下,在1000 °C下进行炭化工艺,得到了具有纳米光栅腔(间距400 nm,高度140 nm)的VC模具。然后,在730 °C和1.84 MPa的温度下,用钠钙玻璃模压形成纳米玻璃光栅,SEM分析证实了纳米级复制的成功。采用OAD工艺在玻璃纳米光栅上沉积了一层铝层,优化了通量角(<70°),以减少侧壁沉积并防止隔离纳米棒。制备的WGP在600 nm处的横磁透射率超过40 %,消光比为~ 40,这与具有轻微侧壁沉积的玻璃WGP模型的模拟结果相似。虽然制作的WGPs的间距不适合可见光应用,但本研究证明了直接模压玻璃纳米光栅结构的WGPs的可行性,在成本,可扩展性和耐用性方面具有优势。该方法有望推进光子应用。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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来源期刊
Manufacturing Letters
Manufacturing Letters Engineering-Industrial and Manufacturing Engineering
CiteScore
4.20
自引率
5.10%
发文量
192
审稿时长
60 days
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