Phase structure engineering of nanostructural silicone-phenolic hybrids toward excellent ablation-resistance

IF 7.4 2区化学 Q1 POLYMER SCIENCE

Polymer Degradation and Stability Pub Date : 2025-08-29 DOI:10.1016/j.polymdegradstab.2025.111634

Yisen Huang, Chuxiang Zhou, Quan Yuan, Xiaofeng Chi, Weiyi Ding, Liwei Yan, Huawei Zou, Yang Chen

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引用次数: 0

Abstract

Silicone-phenolic hybrids (SiPR) featuring unique self-ceramization abilities and excellent thermal-oxidative stabilities have attracted great interest as candidates for thermal protection in extreme environments. However, their applications are limited due to obvious phase separation, which leads to the early failure in the interface. To address these issues, a tailored silicone modified boron-phenolic hybrid (SBPR) is particularly prepared via adding Shiff base-containing organosilane (N-(triethoxysilylpropyl) salicylaldimine, ATSD), as the functional monomer, to a reaction mixture containing boron-phenolic resin (BPR) and triethoxymethylsilane (MTES). Accurate regulation of silicone-rich phase from nano-scale phase separation to molecular-scale homogeneity is achieved by fine tuning the hydrolysis condensation of silicone monomer. Profiting from the binary network with nano-scale phase size and ameliorated interface, optimized SBPR presents fascinating anti-ablation performance, the linear and mass ablation rates show reductions of 102.9 % and 17.02 % compared to those of the BPR counterparts. Moreover, a defined relationship of phase structures with fluorescence performances can be observed in SBPR, validated by the aggregation-induced emission (AIE) characteristics of ATSD. This work provides a promising platform for the phase-structure engineering of SiPR toward advanced thermal protection material designs and applications.

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纳米硅酚醛杂化物的相结构工程研究

硅-酚醛杂化材料（SiPR）具有独特的自陶瓷化能力和优异的热氧化稳定性，作为极端环境下热防护的候选材料引起了人们的极大兴趣。但由于相分离明显，导致界面早期失效，限制了其应用。为了解决这些问题，通过将含有Shiff碱的有机硅烷（N-（三乙氧基硅基丙基）水杨醛二胺，ATSD）作为功能单体，加入到含有硼酚树脂（BPR）和三乙氧基甲基硅烷（MTES）的反应混合物中，制备了定制的硅酮改性硼酚杂化物（SBPR）。通过微调有机硅单体的水解缩聚，实现了从纳米级相分离到分子级相均匀的富硅相精确调控。利用纳米级相尺寸和改进界面的二元网络，优化后的SBPR具有良好的抗烧蚀性能，其线性烧蚀率和质量烧蚀率分别比BPR降低了102.9%和17.02%。此外，在SBPR中可以观察到相结构与荧光性能的明确关系，并通过ATSD的聚集诱导发射（AIE）特性进行了验证。本研究为SiPR相结构工程面向先进热防护材料的设计和应用提供了良好的平台。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

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来源期刊

Polymer Degradation and Stability 化学-高分子科学

CiteScore

10.10

自引率

10.20%

发文量

325

审稿时长

23 days

期刊介绍： Polymer Degradation and Stability deals with the degradation reactions and their control which are a major preoccupation of practitioners of the many and diverse aspects of modern polymer technology. Deteriorative reactions occur during processing, when polymers are subjected to heat, oxygen and mechanical stress, and during the useful life of the materials when oxygen and sunlight are the most important degradative agencies. In more specialised applications, degradation may be induced by high energy radiation, ozone, atmospheric pollutants, mechanical stress, biological action, hydrolysis and many other influences. The mechanisms of these reactions and stabilisation processes must be understood if the technology and application of polymers are to continue to advance. The reporting of investigations of this kind is therefore a major function of this journal. However there are also new developments in polymer technology in which degradation processes find positive applications. For example, photodegradable plastics are now available, the recycling of polymeric products will become increasingly important, degradation and combustion studies are involved in the definition of the fire hazards which are associated with polymeric materials and the microelectronics industry is vitally dependent upon polymer degradation in the manufacture of its circuitry. Polymer properties may also be improved by processes like curing and grafting, the chemistry of which can be closely related to that which causes physical deterioration in other circumstances.