Non-filamentary three-terminal resistivity switch based on interface oxidation/reduction

IF 3.3 4区 材料科学 Q3 CHEMISTRY, PHYSICAL
Daniel Friedzon , Ellen Wachtel , Olga Brontvein , Anna Kossoy , Leonid Chernyak , David Ehre , Igor Lubomirsky
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引用次数: 0

Abstract

We present a three-terminal resistive switching device with a 20 mol% gadolinium-doped ceria (20GDC) thin film as the solid state electrolyte. The device features a top Ta-metal gate electrode and bottom Ta-metal source and drain electrodes, separated by a 1 mm gap filled with 20GDC. Its operation relies on the redox reaction of cerium, specifically the reduction of cerium (IV) to cerium (III) at the interface between the Ta-gate and the 20GDC electrolyte. Under positive gate bias, the Ta gate electrode undergoes oxidation, while cerium is reduced, forming a conductive layer between the source and drain electrodes. Applying a negative gate bias reverses this effect. To confirm that resistivity changes originate from interface redox reactions, we conducted cyclic voltammetry at 403 K. The results demonstrate that peak current is inversely proportional to the scan rate, a characteristic of reaction at a surface. Additionally, we demonstrated that sputtering a TaOx blocking layer beneath the gate electrode suppresses resistive switching. While the resistance changes only by a factor of two, the proposed device operates near equilibrium, is simple to fabricate, and exhibits high robustness. These characteristics make the concept of interface oxidation/reduction appealing for further exploration.
基于界面氧化/还原的非丝状三端电阻率开关
提出了一种以20mol %掺钆铈(20GDC)薄膜为固态电解质的三端电阻开关器件。该器件具有顶部ta -金属栅极和底部ta -金属源极和漏极,中间间隔1mm,填充20GDC。它的运行依赖于铈的氧化还原反应,特别是在ta栅极和20GDC电解质之间的界面处,铈(IV)还原为铈(III)。在正栅极偏压下,Ta栅极被氧化,而铈被还原,在源极和漏极之间形成导电层。施加负栅极偏置可以逆转这种效应。为了证实电阻率的变化是由界面氧化还原反应引起的,我们在403 K下进行了循环伏安法。结果表明,峰值电流与扫描速率成反比,扫描速率是表面反应的一个特征。此外,我们证明了在栅极下溅射一个TaOx阻塞层可以抑制电阻开关。虽然电阻变化仅为两倍,但所提出的器件在接近平衡状态下工作,易于制造,并且具有高稳健性。这些特点使得界面氧化/还原的概念值得进一步探索。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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来源期刊
Solid State Ionics
Solid State Ionics 物理-物理:凝聚态物理
CiteScore
6.10
自引率
3.10%
发文量
152
审稿时长
58 days
期刊介绍: This interdisciplinary journal is devoted to the physics, chemistry and materials science of diffusion, mass transport, and reactivity of solids. The major part of each issue is devoted to articles on: (i) physics and chemistry of defects in solids; (ii) reactions in and on solids, e.g. intercalation, corrosion, oxidation, sintering; (iii) ion transport measurements, mechanisms and theory; (iv) solid state electrochemistry; (v) ionically-electronically mixed conducting solids. Related technological applications are also included, provided their characteristics are interpreted in terms of the basic solid state properties. Review papers and relevant symposium proceedings are welcome.
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