3D N-doped graphene emitters on titanium foam: unleashing enhanced electron field emission performance

IF 3.9 2区材料科学 Q2 MATERIALS SCIENCE, MULTIDISCIPLINARY

Vacuum Pub Date : 2025-08-26 DOI:10.1016/j.vacuum.2025.114698

L.F. Chen , L. Sun , H.Y. Qin

引用次数: 0

Abstract

We fabricate a three-dimensional N-doped graphene/Ti foam field emitter via electrophoretic deposition (EPD), achieving exceptional field emission performance with a record-low turn-on field of 0.75 V/μm and threshold field of 1.49 V/μm. The emitter exhibits a high current density of 1.5 mA/cm² at 1.54 V/μm and maintains stability over 9 h with < 5 % fluctuation. Performance enhancement is attributed to the synergistic effects of nitrogen doping, which reduces the work function, lowers volume resistance and introduces defect sites. The EPD-based scalable fabrication method reduces production costs compared to conventional techniques. These results provide a quantitative framework for designing high-efficiency 3D field emitters for industrial applications.

查看原文本刊更多论文

泡沫钛上的三维n掺杂石墨烯发射器：释放增强的电子场发射性能

我们通过电泳沉积（EPD）制备了三维n掺杂石墨烯/钛泡沫场发射极，具有创纪录的低导通场0.75 V/μm和1.49 V/μm的阈值场，具有优异的场发射性能。该发射极在1.54 V/μm下具有1.5 mA/cm2的高电流密度，并能在9 h内保持稳定，波动率为<； 5%。性能的增强是由于氮掺杂的协同作用，减少了功函数，降低了体积电阻，并引入了缺陷位点。与传统技术相比，基于epd的可扩展制造方法降低了生产成本。这些结果为设计用于工业应用的高效三维场发射器提供了定量框架。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

求助全文

约1分钟内获得全文求助全文

来源期刊

Vacuum 工程技术-材料科学：综合

CiteScore

6.80

自引率

17.50%

发文量

审稿时长

34 days

期刊介绍： Vacuum is an international rapid publications journal with a focus on short communication. All papers are peer-reviewed, with the review process for short communication geared towards very fast turnaround times. The journal also published full research papers, thematic issues and selected papers from leading conferences. A report in Vacuum should represent a major advance in an area that involves a controlled environment at pressures of one atmosphere or below. The scope of the journal includes: 1. Vacuum; original developments in vacuum pumping and instrumentation, vacuum measurement, vacuum gas dynamics, gas-surface interactions, surface treatment for UHV applications and low outgassing, vacuum melting, sintering, and vacuum metrology. Technology and solutions for large-scale facilities (e.g., particle accelerators and fusion devices). New instrumentation ( e.g., detectors and electron microscopes). 2. Plasma science; advances in PVD, CVD, plasma-assisted CVD, ion sources, deposition processes and analysis. 3. Surface science; surface engineering, surface chemistry, surface analysis, crystal growth, ion-surface interactions and etching, nanometer-scale processing, surface modification. 4. Materials science; novel functional or structural materials. Metals, ceramics, and polymers. Experiments, simulations, and modelling for understanding structure-property relationships. Thin films and coatings. Nanostructures and ion implantation.