High-Throughput Design of Epitaxial Orientation for Functional Thin Films

IF 4.4 3区 材料科学 Q2 CHEMISTRY, MULTIDISCIPLINARY
Liyufen Dai, Mingqiang Cheng, Mingqiang Huang, Xiangli Zhong, Gaokuo Zhong
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Abstract

The structure and properties of functional thin films are highly sensitive to their epitaxial orientations. However, the orientation of the thin film is typically constrained by that of the substrate, making it challenging to achieve distinct orientations between the thin film and the substrate. The use of buffer layers is an effective approach to manipulate the epitaxial orientations of functional thin films. Nevertheless, this method requires precise screening of buffer layer parameters that may influence the orientation of the overlying functional layer, making the process labor-intensive and time-consuming. Here, a high-throughput strategy is proposed for screening buffer layer parameters. Taking the epitaxial growth of PbZr1-xTixO3 ferroelectric films as a model system, the optimal thickness of the CoFe2O4 buffer layer is successfully determined, enabling the epitaxial growth of [111]-oriented PbZr0.2Ti0.8O3 on a [001]-oriented Mica substrate. Furthermore, a composite buffer layer structure consisting of SrRuO3 and CoFe2O4 is screened, which facilitated the epitaxial growth of [111]-oriented PbZr1-xTixO3 films on a [001]-oriented SrTiO3 substrate. This work establishes an efficient approach for the high-throughput screening of buffer layer structures and provides valuable insights into the design of epitaxial functional thin films beyond conventional substrate constraints.

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功能薄膜外延取向的高通量设计
功能薄膜的结构和性能对其外延取向高度敏感。然而,薄膜的取向通常受到衬底取向的限制,这使得在薄膜和衬底之间实现不同的取向具有挑战性。利用缓冲层是控制功能薄膜外延取向的有效方法。然而,该方法需要精确筛选可能影响上覆功能层取向的缓冲层参数,使得该过程劳动强度大,耗时长。本文提出了一种筛选缓冲层参数的高通量策略。以PbZr1-xTixO3铁电薄膜的外延生长为模型体系,成功确定了CoFe2O4缓冲层的最佳厚度,实现了[111]取向PbZr0.2Ti0.8O3在[001]取向云母衬底上的外延生长。此外,筛选了由SrRuO3和CoFe2O4组成的复合缓冲层结构,促进了[111]取向PbZr1-xTixO3薄膜在[001]取向SrTiO3衬底上的外延生长。这项工作为缓冲层结构的高通量筛选建立了一种有效的方法,并为超越传统衬底限制的外延功能薄膜的设计提供了有价值的见解。
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来源期刊
Advanced Materials Interfaces
Advanced Materials Interfaces CHEMISTRY, MULTIDISCIPLINARY-MATERIALS SCIENCE, MULTIDISCIPLINARY
CiteScore
8.40
自引率
5.60%
发文量
1174
审稿时长
1.3 months
期刊介绍: Advanced Materials Interfaces publishes top-level research on interface technologies and effects. Considering any interface formed between solids, liquids, and gases, the journal ensures an interdisciplinary blend of physics, chemistry, materials science, and life sciences. Advanced Materials Interfaces was launched in 2014 and received an Impact Factor of 4.834 in 2018. The scope of Advanced Materials Interfaces is dedicated to interfaces and surfaces that play an essential role in virtually all materials and devices. Physics, chemistry, materials science and life sciences blend to encourage new, cross-pollinating ideas, which will drive forward our understanding of the processes at the interface. Advanced Materials Interfaces covers all topics in interface-related research: Oil / water separation, Applications of nanostructured materials, 2D materials and heterostructures, Surfaces and interfaces in organic electronic devices, Catalysis and membranes, Self-assembly and nanopatterned surfaces, Composite and coating materials, Biointerfaces for technical and medical applications. Advanced Materials Interfaces provides a forum for topics on surface and interface science with a wide choice of formats: Reviews, Full Papers, and Communications, as well as Progress Reports and Research News.
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