Ogechukwu Vincentia Ezeh , Juan Jose Ternero-Hidalgo , Rans Miguel Nunag Lintag , Wei Han , King Lun Yeung
{"title":"Exploring innovations in antimicrobial protective mask filters: A review","authors":"Ogechukwu Vincentia Ezeh , Juan Jose Ternero-Hidalgo , Rans Miguel Nunag Lintag , Wei Han , King Lun Yeung","doi":"10.1016/j.cis.2025.103635","DOIUrl":null,"url":null,"abstract":"<div><div>Mask filters are necessary for personal protection. The COVID-19 pandemic exemplified this need. Nonetheless, they can pose risk of transmission as captured microbes or respiratory droplets can remain viable on filters and propagate under ideal environmental conditions. It became evident during the COVID-19 pandemic that conventional masks alone are insufficient for ensuring adequate safety and disrupting the route of spread. Equipping protective masks with antimicrobial property is fundamental to overcoming the survivability of microbes on the surface of filter media and ensuring personal safety. Consequently, this has become a significant research focus, with a sharp upsurge in publications in the COVID-19 era. In this work, we present a comprehensive review of crucial advancements in antimicrobial mask filters, emphasizing the relevance of this topic within the contemporary framework of the COVID-19 pandemic, in addition to the anticipated performance standards associated with the expanding market of antimicrobial protective mask filters.</div></div>","PeriodicalId":239,"journal":{"name":"Advances in Colloid and Interface Science","volume":"345 ","pages":"Article 103635"},"PeriodicalIF":19.3000,"publicationDate":"2025-08-18","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Advances in Colloid and Interface Science","FirstCategoryId":"92","ListUrlMain":"https://www.sciencedirect.com/science/article/pii/S0001868625002465","RegionNum":1,"RegionCategory":"化学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q1","JCRName":"CHEMISTRY, PHYSICAL","Score":null,"Total":0}
引用次数: 0
Abstract
Mask filters are necessary for personal protection. The COVID-19 pandemic exemplified this need. Nonetheless, they can pose risk of transmission as captured microbes or respiratory droplets can remain viable on filters and propagate under ideal environmental conditions. It became evident during the COVID-19 pandemic that conventional masks alone are insufficient for ensuring adequate safety and disrupting the route of spread. Equipping protective masks with antimicrobial property is fundamental to overcoming the survivability of microbes on the surface of filter media and ensuring personal safety. Consequently, this has become a significant research focus, with a sharp upsurge in publications in the COVID-19 era. In this work, we present a comprehensive review of crucial advancements in antimicrobial mask filters, emphasizing the relevance of this topic within the contemporary framework of the COVID-19 pandemic, in addition to the anticipated performance standards associated with the expanding market of antimicrobial protective mask filters.
期刊介绍:
"Advances in Colloid and Interface Science" is an international journal that focuses on experimental and theoretical developments in interfacial and colloidal phenomena. The journal covers a wide range of disciplines including biology, chemistry, physics, and technology.
The journal accepts review articles on any topic within the scope of colloid and interface science. These articles should provide an in-depth analysis of the subject matter, offering a critical review of the current state of the field. The author's informed opinion on the topic should also be included. The manuscript should compare and contrast ideas found in the reviewed literature and address the limitations of these ideas.
Typically, the articles published in this journal are written by recognized experts in the field.