Interfacial stress-insensitive tetragonal (Ba,Ca)TiO3-doped BiFeO3 films with superior ferroelectricity and piezoelectricity

IF 3.6 2区 物理与天体物理 Q2 PHYSICS, APPLIED
Teng Li, Hao Zhuo, Shudong Hu, Botao Shao, Juan Zhang, Yanqi Wu, Liqiang Xu, Feng Chen
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引用次数: 0

Abstract

Highly desired tetragonal BiFeO3 (BF) films with relatively large polarization are usually realized under large compressive epitaxial strain. Herein, we observed that 0.67BiFeO3–0.33(Ba0.85Ca0.15)TiO3 (BF–BCT) films exhibit a stable tetragonal phase and are insensitive to the interfacial stress induced by in-plane lattice mismatch. The films were grown on three distinct (001)-oriented SrTiO3, LaAlO3, and YAlO3 substrates, each with different in-plane lattice constants. The x-ray diffraction analysis confirmed the tetragonal phase of all BF–BCT films, as indicated by a large tetragonality (c/a) greater than 1.05. All these BF–BCT films demonstrated substantial ferroelectric properties with twice the remnant polarization values (2Pr) of 155–208 μC/cm2, and enhanced piezoelectric behavior with effective piezoelectric coefficients (d33*) of 38–52 pm/V. Meanwhile, all BF–BCT films exhibited high stability with minimal performance degradation under varying frequencies (50 Hz–1 kHz) and thermal cycling (25–100 °C). These findings indicate the BF–BCT films as promising candidates for next-generation multifunctional devices.
界面应力不敏感的四方(Ba,Ca) tio3掺杂BiFeO3薄膜具有优异的铁电性和压电性
高期望的具有较大极化的四边形BiFeO3 (BF)薄膜通常在较大的压缩外延应变下实现。研究发现,0.67BiFeO3-0.33 (Ba0.85Ca0.15)TiO3 (BF-BCT)薄膜具有稳定的四边形相,对面内晶格失配引起的界面应力不敏感。薄膜生长在三种不同的(001)取向SrTiO3、LaAlO3和YAlO3衬底上,每种衬底具有不同的面内晶格常数。x射线衍射分析证实所有BF-BCT薄膜均为四方相,具有较大的四方性(c/a),大于1.05。剩余极化值(2Pr)为155 ~ 208 μC/cm2的2倍,有效压电系数(d33*)为38 ~ 52 pm/V,具有良好的铁电性能。同时,所有BF-BCT薄膜在不同频率(50 Hz-1 kHz)和热循环(25-100°C)下均表现出高稳定性,性能下降最小。这些发现表明BF-BCT薄膜是下一代多功能器件的有希望的候选者。
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来源期刊
Applied Physics Letters
Applied Physics Letters 物理-物理:应用
CiteScore
6.40
自引率
10.00%
发文量
1821
审稿时长
1.6 months
期刊介绍: Applied Physics Letters (APL) features concise, up-to-date reports on significant new findings in applied physics. Emphasizing rapid dissemination of key data and new physical insights, APL offers prompt publication of new experimental and theoretical papers reporting applications of physics phenomena to all branches of science, engineering, and modern technology. In addition to regular articles, the journal also publishes invited Fast Track, Perspectives, and in-depth Editorials which report on cutting-edge areas in applied physics. APL Perspectives are forward-looking invited letters which highlight recent developments or discoveries. Emphasis is placed on very recent developments, potentially disruptive technologies, open questions and possible solutions. They also include a mini-roadmap detailing where the community should direct efforts in order for the phenomena to be viable for application and the challenges associated with meeting that performance threshold. Perspectives are characterized by personal viewpoints and opinions of recognized experts in the field. Fast Track articles are invited original research articles that report results that are particularly novel and important or provide a significant advancement in an emerging field. Because of the urgency and scientific importance of the work, the peer review process is accelerated. If, during the review process, it becomes apparent that the paper does not meet the Fast Track criterion, it is returned to a normal track.
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