Defect-Mediated Phase Transitions and Structural Dynamics in Single-Layer VSe2

IF 8.2 2区 材料科学 Q1 MATERIALS SCIENCE, MULTIDISCIPLINARY
Jinbang Hu*, Chaoqin Huang, Lina Liu, Siwen Li, Fei Song, Justin William Wells and Xiansi Wang*, 
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Abstract

Atomic-scale elucidation of phase transition pathways in two-dimensional (2D) materials is practically necessary for achieving desired architectures in next-generation devices, yet it remains hindered by insufficient understanding of defect-mediated kinetics. Here, we study the behavior of Se defects in mediating phase transitions in single-layer (SL) VSe2 grown on Au(111), achieved through controlled thermal annealing and selenium (Se) replenishment. Using scanning tunneling microscopy (STM) and angle-resolved photoemission spectroscopy (ARPES), we find that the initial SL VSe2 is a 1T phase featuring a substrate-induced moiré superstructure and that several annealing stages lead to two defective, Se-poor phases with an increased in-plane lattice constant. Density functional theory (DFT) calculations, which align closely with experimental findings, provide insights into the atomic structures of the defective V selenide compounds. Analysis of the calculated phase transition pathway reveals that the formation of Se defects is directly correlated with the annealing temperature, and the density of Se defects plays an important role in stabilizing the 2H phase in the streaked domain and modulating the phase transition. This study highlights the potential of properly controlling the density of Se defects in VSe2 to manipulate the ratio of different phases within streaked domains, enabling tunable phase-engineered 2D van der Waals structures.

Abstract Image

缺陷介导的单层VSe2相变和结构动力学。
在二维(2D)材料中,原子尺度的相变途径的阐明对于实现下一代器件的理想结构实际上是必要的,但它仍然受到对缺陷介导动力学理解不足的阻碍。在此,我们研究了在Au(111)上生长的单层(SL) VSe2中,通过控制热退火和补充硒(Se)来实现Se缺陷在相变中的行为。利用扫描隧道显微镜(STM)和角度分辨光发射光谱(ARPES),我们发现初始的SL VSe2是一个1T相,具有衬底诱导的莫尔莫尔上层结构,几个退火阶段导致两个缺陷的贫硒相,其面内晶格常数增加。密度泛函理论(DFT)计算与实验结果密切相关,提供了对缺陷硒化V化合物的原子结构的见解。对计算得到的相变路径分析表明,Se缺陷的形成与退火温度直接相关,Se缺陷的密度对稳定条纹畴中的2H相和调制相变起着重要作用。该研究强调了适当控制VSe2中Se缺陷的密度以操纵条纹域内不同相的比例的潜力,从而实现可调的相位工程二维范德华结构。
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来源期刊
ACS Applied Materials & Interfaces
ACS Applied Materials & Interfaces 工程技术-材料科学:综合
CiteScore
16.00
自引率
6.30%
发文量
4978
审稿时长
1.8 months
期刊介绍: ACS Applied Materials & Interfaces is a leading interdisciplinary journal that brings together chemists, engineers, physicists, and biologists to explore the development and utilization of newly-discovered materials and interfacial processes for specific applications. Our journal has experienced remarkable growth since its establishment in 2009, both in terms of the number of articles published and the impact of the research showcased. We are proud to foster a truly global community, with the majority of published articles originating from outside the United States, reflecting the rapid growth of applied research worldwide.
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