Accessible and thorough magnetic field mapping of TEMs using a commercial Hall-sensor and TEM automation for in situ magnetic experiments

IF 2.2 3区工程技术 Q1 MICROSCOPY

Micron Pub Date : 2025-07-19 DOI:10.1016/j.micron.2025.103877

Sivert Dagenborg, Kristian Tveitstøl, Iryna Zelenina, Gregory Nordahl , Magnus Nord

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Abstract

For imaging and quantitative in situ experiments of magnetic materials in the transmission electron microscope (TEM), knowing the external magnetic field over the sample position and the parameters affecting it is crucial. Calibrating this thoroughly also requires an efficient method for sampling a large set of parameters. This work presents accessible solutions to both these problems, using a commercial Hall-sensor soldered onto a custom printed circuit board then inserted into a TEM biasing holder. This is enhanced by TEM automation using open-source Python scripting, enabling thorough and effective experimental measurements. The magnetic field in the sample position was measured over a range of positions, tilts and lens excitations for three different TEMs: The JEOL JEM-2100F. JEOL JEM 2100,and JEOL JEM-ARM200F. In objective lens-off mode these have remnant fields of up to respectively 19.19 mT, 15.24 mT and 8.95 mT, all oriented downwards in the column. The magnetic fields had a strong decay in x- and y-positions of up to 13.1%. The objective lens gave a highly linear response to lens excitation up to 27.5% of max excitation. For the 2100F and 2100, fully exciting the objective lens caused a significant change in remnant field of above 4 mT which was counteracted with lens relaxation. The image aberration corrector lenses in the ARM200F caused changes of 0.2 mT. This magnetic field mapping enables quantitative in situ experiments with magnetic fields up to 2 T.

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使用商用霍尔传感器和TEM自动化进行原位磁实验的TEM易于访问和彻底的磁场测绘

对于磁性材料在透射电子显微镜下的成像和定量原位实验，了解样品位置上的外磁场及其影响参数是至关重要的。彻底校准还需要一种有效的方法来对大量参数进行采样。这项工作为这两个问题提供了可行的解决方案，将商用霍尔传感器焊接到定制印刷电路板上，然后插入TEM偏置支架。使用开源Python脚本的TEM自动化增强了这一点，从而实现了彻底而有效的实验测量。在三种不同的tem下，在不同的位置、倾斜和透镜激励下测量样品位置的磁场：JEOL JEM-2100F。jejem 2100和jejem - arm200f。在物镜关闭模式下，它们的残余视场分别高达19.19 mT， 15.24 mT和8.95 mT，在柱中都向下定向。磁场在x轴和y轴位置的衰减高达13.1%。物镜对透镜激励的线性响应可达最大激励的27.5%。对于2100F和2100，充分激发物镜会引起4 mT以上残余场的显著变化，而这种变化被物镜松弛所抵消。ARM200F中的像差校正透镜引起0.2 mT的变化。这种磁场映射可以在高达2 T的磁场下进行定量原位实验。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

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来源期刊

Micron 工程技术-显微镜技术

CiteScore

4.30

自引率

4.20%

发文量

100

审稿时长

31 days

期刊介绍： Micron is an interdisciplinary forum for all work that involves new applications of microscopy or where advanced microscopy plays a central role. The journal will publish on the design, methods, application, practice or theory of microscopy and microanalysis, including reports on optical, electron-beam, X-ray microtomography, and scanning-probe systems. It also aims at the regular publication of review papers, short communications, as well as thematic issues on contemporary developments in microscopy and microanalysis. The journal embraces original research in which microscopy has contributed significantly to knowledge in biology, life science, nanoscience and nanotechnology, materials science and engineering.