Fabrication of Titanium Nitride Thin Film on Titanium Using Cathodic Arc Plasma Evaporation for Biomedical Application.

Q1 Dentistry
Trung Van Trinh, Hung Thai Le, Bang Le Thi
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引用次数: 0

Abstract

Commercially pure titanium (Cp-Ti) is often used for biomedical implant devices but has low hardness and wear resistance; therefore, it is not suitable for use in the sliding parts or joints. Owing to their good wear resistance and biocompatibility, titanium nitride (TiN) coatings are used to improve these surface properties of Ti. This study aims to fabricate TiN on Cp-Ti by cathodic arc plasma evaporation and to investigate the effect of Cp-Ti substrate temperature on the properties of coated TiN thin films for biomedical applications.Coated TiN thin films were deposited on Cp-Ti at different substrate temperatures of 25, 100, 175, and 250°C. The surface morphology, roughness, phase composition, hardness, coating adhesion, and biocompatibility of the TiN coatings were investigated using a digital optical microscope, scanning electron microscope, X-ray diffractometer, hardness tester, and in vitro cell studies.Statistical differences were evaluated using analysis of variance (ANOVA) and Tukey's multiple comparison analysis, with statistical significance set at p < 0.05.Thin films with a primary TiN phase were formed on the surface of the Cp-Ti substrate regardless of substrate temperatures. There was no significant difference in surface hardness between the coated samples even though the sample coated at 100 and 175°C showed a slightly higher values, ranging from 193 to 199 HV. Interestingly, surface roughness and coating adhesion were significantly influenced by substrate temperature. The higher the substrate temperature, the greater the surface roughness, while the best adhesion, with the hardness of 176 HV, was obtained at substrate temperature of 25°C. In vitro cell study indicated that the baby hamster kidney cells on the coating surface have grown and proliferated better than those on the uncoated surface.The TiN thin film was successfully coated on Ti by cathodic arc plasma evaporation at different substrate temperatures, ranging from 25 to 250°C. The adhesion of the coating at low substrate temperature (25°C) was the best compared to other substrate temperatures of 100, 175, and 250°C. In vitro cell studies have demonstrated the biocompatibility of the coated TiN thin film.

应用阴极电弧等离子体蒸发在钛上制备医用氮化钛薄膜。
商业纯钛(Cp-Ti)通常用于生物医学植入装置,但硬度和耐磨性较低;因此,它不适合用于滑动部件或连接处。氮化钛(TiN)涂层具有良好的耐磨性和生物相容性,可用于改善钛的表面性能。本研究旨在通过阴极电弧等离子体蒸发在Cp-Ti上制备TiN,并研究Cp-Ti衬底温度对生物医学用涂层TiN薄膜性能的影响。在25、100、175和250℃的不同衬底温度下,在Cp-Ti上沉积了涂层TiN薄膜。采用数码光学显微镜、扫描电镜、x射线衍射仪、硬度计和体外细胞实验对TiN涂层的表面形貌、粗糙度、相组成、硬度、涂层附着力和生物相容性进行了研究。采用方差分析(ANOVA)和Tukey’s多重比较分析进行统计学差异评估,统计学显著性设为p。体外细胞研究表明,涂覆表面的仓鼠幼鼠肾细胞生长和增殖优于未涂覆表面。在25 ~ 250℃的不同衬底温度下,通过阴极电弧等离子体蒸发,成功地将TiN薄膜涂覆在Ti表面。与100、175和250℃的底材温度相比,涂层在低底材温度(25℃)下的附着力最好。体外细胞研究证明了涂层TiN薄膜的生物相容性。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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来源期刊
European Journal of Dentistry
European Journal of Dentistry Dentistry-Dentistry (all)
CiteScore
5.10
自引率
0.00%
发文量
161
期刊介绍: The European Journal of Dentistry is the official journal of the Dental Investigations Society, based in Turkey. It is a double-blinded peer-reviewed, Open Access, multi-disciplinary international journal addressing various aspects of dentistry. The journal''s board consists of eminent investigators in dentistry from across the globe and presents an ideal international composition. The journal encourages its authors to submit original investigations, reviews, and reports addressing various divisions of dentistry including oral pathology, prosthodontics, endodontics, orthodontics etc. It is available both online and in print.
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