Recent developments on titanium based mono and multilayer nitride films deposited through HiPIMS

Abstract

High Power Impulse Magnetron Sputtering (HiPIMS) is a notable advancement under Physical Vapor Deposition (PVD) techniques, achieving plasma densities of 10¹⁸–10¹⁹ m⁻³ and ionization levels over 70 %, resulting in a transient plasma with exceptional ion energy and density. This intense ionization enables precise control over film microstructure, morphology, and elemental composition, leading to dense, smooth films with enhanced adhesion. This review begins with a comprehensive analysis of plasma dynamics in the HiPIMS process, followed by a systematic evaluation of the mechanical, tribological, and electrochemical properties of various coatings, including TiN, TiAlN, TiCN, TiSiN, TiAlCN, TiZrN, TiAlCrN, and related systems. Various Finding reveals that HiPIMS processing consistently enhances hardness, wear resistance, fracture toughness, and corrosion resistance compared to DCMS, primarily by promoting denser microstructures and beneficial residual stress. Furthermore, the incorporation of elements like Al, Si, C, Cr, and V is shown to further modify and improve properties, crucial for high-performance applications. Recent advancements in multipulse-HiPIMS and Synchronous Pulsed DC (SPDC) HiPIMS modes have demonstrated notable improvements in deposition rate, microstructural refinement, and coating hardness. However, these benefits are accompanied by increased residual stresses and adhesion challenges, highlighting the need for further process optimization. HiPIMS represents a pivotal advancement for depositing high-performance hard nitride coatings applicable across diverse and demanding industrial sectors, including cutting tools, energy storage, and protective applications. The review identifies existing challenges in the hard coatings field and provides insights into potential future directions for research and development.