Effect of pulsed bias power on electron density modulation in inductively coupled plasma

IF 3.6 2区物理与天体物理 Q2 PHYSICS, APPLIED

Applied Physics Letters Pub Date : 2025-07-21 DOI:10.1063/5.0275598

Gwang-Seok Chae, Youbin Seol, Hee-Jung Yeom, Chanhee Son, Seunghun Lee, Jung-Hyung Kim, Hyo-Chang Lee

{"title":"Effect of pulsed bias power on electron density modulation in inductively coupled plasma","authors":"Gwang-Seok Chae, Youbin Seol, Hee-Jung Yeom, Chanhee Son, Seunghun Lee, Jung-Hyung Kim, Hyo-Chang Lee","doi":"10.1063/5.0275598","DOIUrl":null,"url":null,"abstract":"In this study, we investigate the temporal behavior of electron density in an inductively coupled plasma (ICP) subjected to pulsed radio frequency (RF) bias using a Fourier cutoff probe measurement. This diagnostic technique enables high temporal resolution measurements at a relevant timescale, which are essential for capturing the dynamic plasma response during bias modulation. Upon the initiation of bias pulse, a transient drop in electron density—referred to as electron suction—is observed, resulting from the rapid rise in bias voltage outpacing the measured plasma response. Notably, this behavior appears in both E-mode and H-mode conditions of inductively coupled plasma (ICP) discharges, indicating that it is independent of the specific discharge mode. Furthermore, a significant electron suction is observed as the time-averaged electron density decreases. This electron suction induced by the RF pulse can be interpreted through its correlation with plasma and sheath formation. These findings provide critical insight into the transient characteristics of pulsed plasmas and offer guidance for the development of next-generation plasma-based manufacturing technologies.","PeriodicalId":8094,"journal":{"name":"Applied Physics Letters","volume":"9 1","pages":""},"PeriodicalIF":3.6000,"publicationDate":"2025-07-21","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Applied Physics Letters","FirstCategoryId":"101","ListUrlMain":"https://doi.org/10.1063/5.0275598","RegionNum":2,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q2","JCRName":"PHYSICS, APPLIED","Score":null,"Total":0}

引用次数: 0

Abstract

In this study, we investigate the temporal behavior of electron density in an inductively coupled plasma (ICP) subjected to pulsed radio frequency (RF) bias using a Fourier cutoff probe measurement. This diagnostic technique enables high temporal resolution measurements at a relevant timescale, which are essential for capturing the dynamic plasma response during bias modulation. Upon the initiation of bias pulse, a transient drop in electron density—referred to as electron suction—is observed, resulting from the rapid rise in bias voltage outpacing the measured plasma response. Notably, this behavior appears in both E-mode and H-mode conditions of inductively coupled plasma (ICP) discharges, indicating that it is independent of the specific discharge mode. Furthermore, a significant electron suction is observed as the time-averaged electron density decreases. This electron suction induced by the RF pulse can be interpreted through its correlation with plasma and sheath formation. These findings provide critical insight into the transient characteristics of pulsed plasmas and offer guidance for the development of next-generation plasma-based manufacturing technologies.

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脉冲偏置功率对电感耦合等离子体中电子密度调制的影响

在这项研究中，我们研究了电感耦合等离子体（ICP）在脉冲射频（RF）偏置下电子密度的时间行为，使用傅里叶截止探针测量。这种诊断技术能够在相关的时间尺度上进行高时间分辨率的测量，这对于捕获偏置调制期间的动态等离子体响应至关重要。在偏置脉冲开始时，观察到电子密度的瞬态下降，即电子吸力，这是由于偏置电压的快速上升超过了测量的等离子体响应。值得注意的是，这种行为在电感耦合等离子体（ICP）放电的e模式和h模式条件下都出现，表明它与特定的放电模式无关。此外，随着时间平均电子密度的减小，观察到明显的电子吸力。这种由射频脉冲引起的电子吸力可以通过其与等离子体和鞘层形成的相关性来解释。这些发现对脉冲等离子体的瞬态特性提供了重要的见解，并为下一代等离子体制造技术的发展提供了指导。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

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来源期刊

Applied Physics Letters 物理-物理：应用

CiteScore

6.40

自引率

10.00%

发文量

1821

审稿时长

1.6 months

期刊介绍： Applied Physics Letters (APL) features concise, up-to-date reports on significant new findings in applied physics. Emphasizing rapid dissemination of key data and new physical insights, APL offers prompt publication of new experimental and theoretical papers reporting applications of physics phenomena to all branches of science, engineering, and modern technology. In addition to regular articles, the journal also publishes invited Fast Track, Perspectives, and in-depth Editorials which report on cutting-edge areas in applied physics. APL Perspectives are forward-looking invited letters which highlight recent developments or discoveries. Emphasis is placed on very recent developments, potentially disruptive technologies, open questions and possible solutions. They also include a mini-roadmap detailing where the community should direct efforts in order for the phenomena to be viable for application and the challenges associated with meeting that performance threshold. Perspectives are characterized by personal viewpoints and opinions of recognized experts in the field. Fast Track articles are invited original research articles that report results that are particularly novel and important or provide a significant advancement in an emerging field. Because of the urgency and scientific importance of the work, the peer review process is accelerated. If, during the review process, it becomes apparent that the paper does not meet the Fast Track criterion, it is returned to a normal track.