Tantalum–Hafnium: Optical Hydrogen Sensing Materials for High-Temperature Applications

IF 8.2 2区 材料科学 Q1 MATERIALS SCIENCE, MULTIDISCIPLINARY
Ilse van Ogtrop, Amy Navarathna, Herman Schreuders, Bernard Dam and Lars J. Bannenberg*, 
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引用次数: 0

Abstract

Thin film metal hydride optical sensors, especially those made from tantalum, offer a large, hysteresis-free hydrogen sensing range, fast response times and great stability. However, due to the shift in tantalum’s hydrogen sensing ranges with rising temperatures, tantalum becomes inadequate for the detection of low hydrogen concentrations (<10+3 ppm) above 200 °C, making it unsuitable for high-temperature applications. We show that the properties of tantalum can be tailored by alloying tantalum with hafnium. Optical transmission measurements, ex situ and in situ X-ray diffraction and X-ray and neutron reflectometry are used to show that the introduction of Hf in Ta results in a solid solution with a stable structure with up to 21% Hf. Alloying Ta with Hf expands the unit cell, which alters the enthalpy of hydrogenation and shifts the sensing range to lower concentrations. Moreover, alloying Ta with Hf improves the sensitivity at low hydrogen concentrations (<10+3 ppm) and for temperatures exceeding 200 °C by about two times compared to pure Ta while preserving its large, hysteresis-free sensing range and excellent stability.

钽铪:用于高温应用的光学氢传感材料。
薄膜金属氢化物光学传感器,特别是那些由钽制成的,提供了一个大的,无迟滞的氢传感范围,快速的响应时间和极大的稳定性。然而,由于钽的氢传感范围随着温度的升高而变化,钽变得不适合检测200°C以上的低氢浓度(<10+ 3ppm),因此不适合高温应用。我们证明了钽与铪的合金化可以定制钽的性能。光学透射测量、非原位和原位x射线衍射以及x射线和中子反射表明,在Ta中引入Hf可以得到具有高达21% Hf的稳定结构的固溶体。将Ta与Hf合金化扩展了单体电池,从而改变了氢化焓并将感应范围转移到较低浓度。此外,将Ta与Hf合金在低氢浓度(<10+3 ppm)和温度超过200°C时的灵敏度比纯Ta提高了约两倍,同时保持了大的无迟滞传感范围和优异的稳定性。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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来源期刊
ACS Applied Materials & Interfaces
ACS Applied Materials & Interfaces 工程技术-材料科学:综合
CiteScore
16.00
自引率
6.30%
发文量
4978
审稿时长
1.8 months
期刊介绍: ACS Applied Materials & Interfaces is a leading interdisciplinary journal that brings together chemists, engineers, physicists, and biologists to explore the development and utilization of newly-discovered materials and interfacial processes for specific applications. Our journal has experienced remarkable growth since its establishment in 2009, both in terms of the number of articles published and the impact of the research showcased. We are proud to foster a truly global community, with the majority of published articles originating from outside the United States, reflecting the rapid growth of applied research worldwide.
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