The Effect of Sulfur Vacancy Distribution on Charge Transport across MoS2 Monolayers: A Quantum Mechanical Study.

IF 6.5 Q2 CHEMISTRY, PHYSICAL
ACS Materials Au Pub Date : 2025-06-06 eCollection Date: 2025-07-09 DOI:10.1021/acsmaterialsau.4c00171
Hanna Kuperman Benedik, Naomi Rom, Maytal Caspary Toroker
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引用次数: 0

Abstract

Molybdenum disulfide (MoS2) monolayers are two-dimensional materials belonging to a family of materials called transition metal dichalcogenides which have been widely studied as potential semiconductors for next-generation ingredients in transistor technology. Electronic devices' performance is largely influenced by defects, and in the case of MoS2, the most dominant defects are sulfur vacancies. The correlation between charge transport across MoS2 and sulfur vacancies is complex and not trivial, and it is still unclear how the distribution of vacancies influences electronic conductivity. In this study, MoS2 monolayers with various sulfur vacancies concentrations and distributions were examined using density functional theory for electronic structure properties, tight-binding (TB) theory to construct the TB Hamiltonian, nonequilibrium Green's function formalism for transmission function calculations, and Landauer-Büttiker formalism for calculating charge transport. In addition, we employed design of experiments analysis to identify important structural features influencing the calculated current and to fit an empirical model to the results. We found that higher vacancy concentrations lead to a significant increase in electron permeability, with the best results occurring when sulfur vacancies were arranged in lines with alternating presence across both layers. The ability to predict charge transport across MoS2 monolayers based on sulfur vacancy distribution can assist in the design of functional materials with desired properties, aiming to selectively apply structural defects.

硫空位分布对MoS2单层电荷输运的影响:量子力学研究。
二硫化钼(MoS2)单层是一种二维材料,属于过渡金属二硫族化合物,作为晶体管技术中下一代材料的潜在半导体材料被广泛研究。电子器件的性能在很大程度上受到缺陷的影响,在二硫化钼的情况下,最主要的缺陷是硫空位。MoS2和硫空位之间的电荷输运关系是复杂而非微不足道的,而且空位分布如何影响电子导电性仍不清楚。在本研究中,采用密度泛函理论研究具有不同硫空位浓度和分布的二硫化钼单层的电子结构性质,采用紧结合(TB)理论构建TB哈密顿量,采用非平衡格林函数形式计算传输函数,采用landauer - bttiker形式计算电荷输运。此外,我们采用实验分析设计来识别影响计算电流的重要结构特征,并将经验模型拟合到结果中。我们发现,较高的空位浓度导致电子渗透率显著增加,当硫空位在两层之间交替排列时,结果最好。基于硫空位分布预测MoS2单层间电荷输运的能力可以帮助设计具有理想性能的功能材料,旨在选择性地应用结构缺陷。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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来源期刊
ACS Materials Au
ACS Materials Au 材料科学-
CiteScore
5.00
自引率
0.00%
发文量
0
期刊介绍: ACS Materials Au is an open access journal publishing letters articles reviews and perspectives describing high-quality research at the forefront of fundamental and applied research and at the interface between materials and other disciplines such as chemistry engineering and biology. Papers that showcase multidisciplinary and innovative materials research addressing global challenges are especially welcome. Areas of interest include but are not limited to:Design synthesis characterization and evaluation of forefront and emerging materialsUnderstanding structure property performance relationships and their underlying mechanismsDevelopment of materials for energy environmental biomedical electronic and catalytic applications
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