A passivation study for AlInAsSb avalanche photodiodes

IF 3.6 2区物理与天体物理 Q2 PHYSICS, APPLIED

Applied Physics Letters Pub Date : 2025-07-16 DOI:10.1063/5.0278018

Qi Lin, Hannaneh Karimi, Daniel J. Herrera, Ellie Wang, Seth R. Bank, Joe. C. Campbell

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引用次数: 0

Abstract

Avalanche photodiodes (APDs) are vital for a wide range of commercial, military, and research applications. Recently, the AlxIn1–xAsySb1–y digital alloy system has emerged as a promising material for next-generation APDs, offering a broadly tunable bandgap, high avalanche gain, and low excess noise. However, surface oxidation and defect formation on the etched Al0.7InAsSb sidewalls of mesa-structure devices can significantly increase device dark currents, degrade the signal-to-noise ratio, and limit device reliability. Effective surface passivation is thus essential for suppressing dark current and enhancing device performance. In this study, we systematically compare the impact of different passivation techniques, including SU-8 polymer, atomic layer deposition (ALD)-HfO2, and ALD-Al2O3, deposited at various temperatures, on the performance of Al0.7InAsSb p–i–n APDs grown on InP substrates. Our results demonstrate that ALD-Al2O3 passivation at 150 °C achieves the most substantial reduction in dark current, increased breakdown voltage, and better thermal stability during heat exposure. This work provides valuable insights into developing high-performance, low-noise APDs suitable for demanding and commercially relevant optoelectronic applications.

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AlInAsSb雪崩光电二极管的钝化研究

雪崩光电二极管（apd）对于广泛的商业，军事和研究应用至关重要。最近，AlxIn1-xAsySb1-y数字合金系统已成为下一代apd的一种有前途的材料，具有宽可调带隙，高雪崩增益和低过量噪声。然而，平台结构器件的蚀刻Al0.7InAsSb侧壁表面氧化和缺陷形成会显著增加器件暗电流，降低信噪比，限制器件可靠性。因此，有效的表面钝化对于抑制暗电流和提高器件性能至关重要。在这项研究中，我们系统地比较了不同钝化技术，包括在不同温度下沉积的SU-8聚合物，原子层沉积(ALD)-HfO2和ALD- al2o3，对生长在InP衬底上的Al0.7InAsSb p-i-n APDs性能的影响。我们的研究结果表明，在150°C下ALD-Al2O3钝化可以最大程度地降低暗电流，提高击穿电压，并且在热暴露时具有更好的热稳定性。这项工作为开发高性能，低噪声apd提供了有价值的见解，适用于要求苛刻和商业相关的光电应用。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

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来源期刊

Applied Physics Letters 物理-物理：应用

CiteScore

6.40

自引率

10.00%

发文量

1821

审稿时长

1.6 months

期刊介绍： Applied Physics Letters (APL) features concise, up-to-date reports on significant new findings in applied physics. Emphasizing rapid dissemination of key data and new physical insights, APL offers prompt publication of new experimental and theoretical papers reporting applications of physics phenomena to all branches of science, engineering, and modern technology. In addition to regular articles, the journal also publishes invited Fast Track, Perspectives, and in-depth Editorials which report on cutting-edge areas in applied physics. APL Perspectives are forward-looking invited letters which highlight recent developments or discoveries. Emphasis is placed on very recent developments, potentially disruptive technologies, open questions and possible solutions. They also include a mini-roadmap detailing where the community should direct efforts in order for the phenomena to be viable for application and the challenges associated with meeting that performance threshold. Perspectives are characterized by personal viewpoints and opinions of recognized experts in the field. Fast Track articles are invited original research articles that report results that are particularly novel and important or provide a significant advancement in an emerging field. Because of the urgency and scientific importance of the work, the peer review process is accelerated. If, during the review process, it becomes apparent that the paper does not meet the Fast Track criterion, it is returned to a normal track.