A comprehensive evaluation method for the effect of multiple environmental disturbance sources on scanning electron microscopy imaging by calculating distance correlation coefficients

IF 2.2 3区 工程技术 Q1 MICROSCOPY
Junhyeok Hwang , In-Yong Park , Takashi Ogawa
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引用次数: 0

Abstract

A scanning electron microscope (SEM), an essential tool for high-resolution imaging at the nanometer scale, frequently suffers from the harmful effects of various environmental disturbance sources, such as magnetic, acoustic, and mechanical vibrations. Because these disturbance sources appear as similar defects on SEM images, identifying the major source is not straightforward but remains crucial for implementing countermeasures. This study presents a comprehensive evaluation method for assessing and analyzing the impact of these environmental disturbance sources on imaging. The method uses multiple sensors around the SEM, measures 10 channel signals in real time, analyzes frequency, and estimates the impact of the disturbance. Together with Fourier transform using Welch’s method, the distance correlation coefficient (DCC) analysis demonstrates the capability of the method to identify the major disturbance sources and assess their influence on SEM images. In particular, the DCC method is effective in determining the major disturbance source even in complex conditions in which multiple disturbance sources have a common frequency component or mixed influence on SEM imaging. This comprehensive approach to evaluating the impact of environmental disturbance on SEM imaging offers significant insights into maximizing SEM performance by mitigating harmful effects from the environment, thereby contributing to the improvement of not only image quality but also measurement accuracy based on SEM.
基于距离相关系数的多环境干扰源对扫描电镜成像影响的综合评价方法
扫描电子显微镜(SEM)是纳米级高分辨率成像的重要工具,经常受到各种环境干扰源的有害影响,如磁、声和机械振动。由于这些干扰源在SEM图像上表现为类似的缺陷,因此确定主要干扰源并不简单,但对于实施对策仍然至关重要。本研究提出了一种综合评价方法来评估和分析这些环境干扰源对成像的影响。该方法在扫描电镜周围使用多个传感器,实时测量10个通道信号,分析频率,并估计干扰的影响。结合使用Welch方法的傅里叶变换,距离相关系数(DCC)分析证明了该方法能够识别主要干扰源并评估其对SEM图像的影响。特别是,即使在多个干扰源具有共同频率分量或对SEM成像的混合影响的复杂条件下,DCC方法也能有效地确定主要干扰源。这种评估环境干扰对扫描电镜成像影响的综合方法为通过减轻环境的有害影响来最大化扫描电镜性能提供了重要的见解,从而有助于提高图像质量和基于扫描电镜的测量精度。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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来源期刊
Micron
Micron 工程技术-显微镜技术
CiteScore
4.30
自引率
4.20%
发文量
100
审稿时长
31 days
期刊介绍: Micron is an interdisciplinary forum for all work that involves new applications of microscopy or where advanced microscopy plays a central role. The journal will publish on the design, methods, application, practice or theory of microscopy and microanalysis, including reports on optical, electron-beam, X-ray microtomography, and scanning-probe systems. It also aims at the regular publication of review papers, short communications, as well as thematic issues on contemporary developments in microscopy and microanalysis. The journal embraces original research in which microscopy has contributed significantly to knowledge in biology, life science, nanoscience and nanotechnology, materials science and engineering.
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