A comprehensive evaluation method for the effect of multiple environmental disturbance sources on scanning electron microscopy imaging by calculating distance correlation coefficients
{"title":"A comprehensive evaluation method for the effect of multiple environmental disturbance sources on scanning electron microscopy imaging by calculating distance correlation coefficients","authors":"Junhyeok Hwang , In-Yong Park , Takashi Ogawa","doi":"10.1016/j.micron.2025.103876","DOIUrl":null,"url":null,"abstract":"<div><div>A scanning electron microscope (SEM), an essential tool for high-resolution imaging at the nanometer scale, frequently suffers from the harmful effects of various environmental disturbance sources, such as magnetic, acoustic, and mechanical vibrations. Because these disturbance sources appear as similar defects on SEM images, identifying the major source is not straightforward but remains crucial for implementing countermeasures. This study presents a comprehensive evaluation method for assessing and analyzing the impact of these environmental disturbance sources on imaging. The method uses multiple sensors around the SEM, measures 10 channel signals in real time, analyzes frequency, and estimates the impact of the disturbance. Together with Fourier transform using Welch’s method, the distance correlation coefficient (DCC) analysis demonstrates the capability of the method to identify the major disturbance sources and assess their influence on SEM images. In particular, the DCC method is effective in determining the major disturbance source even in complex conditions in which multiple disturbance sources have a common frequency component or mixed influence on SEM imaging. This comprehensive approach to evaluating the impact of environmental disturbance on SEM imaging offers significant insights into maximizing SEM performance by mitigating harmful effects from the environment, thereby contributing to the improvement of not only image quality but also measurement accuracy based on SEM.</div></div>","PeriodicalId":18501,"journal":{"name":"Micron","volume":"198 ","pages":"Article 103876"},"PeriodicalIF":2.2000,"publicationDate":"2025-07-09","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Micron","FirstCategoryId":"5","ListUrlMain":"https://www.sciencedirect.com/science/article/pii/S0968432825000940","RegionNum":3,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q1","JCRName":"MICROSCOPY","Score":null,"Total":0}
引用次数: 0
Abstract
A scanning electron microscope (SEM), an essential tool for high-resolution imaging at the nanometer scale, frequently suffers from the harmful effects of various environmental disturbance sources, such as magnetic, acoustic, and mechanical vibrations. Because these disturbance sources appear as similar defects on SEM images, identifying the major source is not straightforward but remains crucial for implementing countermeasures. This study presents a comprehensive evaluation method for assessing and analyzing the impact of these environmental disturbance sources on imaging. The method uses multiple sensors around the SEM, measures 10 channel signals in real time, analyzes frequency, and estimates the impact of the disturbance. Together with Fourier transform using Welch’s method, the distance correlation coefficient (DCC) analysis demonstrates the capability of the method to identify the major disturbance sources and assess their influence on SEM images. In particular, the DCC method is effective in determining the major disturbance source even in complex conditions in which multiple disturbance sources have a common frequency component or mixed influence on SEM imaging. This comprehensive approach to evaluating the impact of environmental disturbance on SEM imaging offers significant insights into maximizing SEM performance by mitigating harmful effects from the environment, thereby contributing to the improvement of not only image quality but also measurement accuracy based on SEM.
期刊介绍:
Micron is an interdisciplinary forum for all work that involves new applications of microscopy or where advanced microscopy plays a central role. The journal will publish on the design, methods, application, practice or theory of microscopy and microanalysis, including reports on optical, electron-beam, X-ray microtomography, and scanning-probe systems. It also aims at the regular publication of review papers, short communications, as well as thematic issues on contemporary developments in microscopy and microanalysis. The journal embraces original research in which microscopy has contributed significantly to knowledge in biology, life science, nanoscience and nanotechnology, materials science and engineering.