Influence of water vapor on Nujol adsorption and desorption on quartz and calcite surfaces: A near-ambient pressure X-ray photoelectron spectroscopy and ambient atomic force microscopy study
IF 3.9 2区 材料科学Q2 MATERIALS SCIENCE, MULTIDISCIPLINARY
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引用次数: 0
Abstract
The stability of oil/substrate interaction upon external stimuli is a critical issue for enhanced oil recovery (EOR) processes and catalytic applications. In this study, we address how the Nujol films behaves on well-defined SiO2(001) and CaCO(104) surfaces against water vapor pressure (2 mbar) and ultra-high vacuum (UHV) environment (10−10 mbar) by in-situ near-ambient pressure X-ray photoelectron spectroscopy measurement (NAP-XPS) and ex-situ by atomic force microscopy (AFM). The specimen conditioning with Nujol resulted in a film of 2 nm on SiO2 and up 4 nm on CaCO. The chemical composition of Nujol/SiO2 interface does not vary significantly against treatment, although its topography passes from continuous to cluster like in DW/Nujol/SiO2 interface. In Nujol/CaCO interface oil component reduces by: (i) 20% in UHV and (ii) 60% after controlled exposure to DW vapor pressure (2 mbar). The modification of interface chemical composition is reflected into the alteration of Nujol film topography on CaCO that varies from continuous to fragmented film after 12 h in UHV and substantially reorganizes itself after exposure to p(HO) = 2 mbar. Our results highlight the role of water in reshaping the oil-oxide interface under controlled environmental conditions and its relevance in oil removal process.
期刊介绍:
Vacuum is an international rapid publications journal with a focus on short communication. All papers are peer-reviewed, with the review process for short communication geared towards very fast turnaround times. The journal also published full research papers, thematic issues and selected papers from leading conferences.
A report in Vacuum should represent a major advance in an area that involves a controlled environment at pressures of one atmosphere or below.
The scope of the journal includes:
1. Vacuum; original developments in vacuum pumping and instrumentation, vacuum measurement, vacuum gas dynamics, gas-surface interactions, surface treatment for UHV applications and low outgassing, vacuum melting, sintering, and vacuum metrology. Technology and solutions for large-scale facilities (e.g., particle accelerators and fusion devices). New instrumentation ( e.g., detectors and electron microscopes).
2. Plasma science; advances in PVD, CVD, plasma-assisted CVD, ion sources, deposition processes and analysis.
3. Surface science; surface engineering, surface chemistry, surface analysis, crystal growth, ion-surface interactions and etching, nanometer-scale processing, surface modification.
4. Materials science; novel functional or structural materials. Metals, ceramics, and polymers. Experiments, simulations, and modelling for understanding structure-property relationships. Thin films and coatings. Nanostructures and ion implantation.