Enhancement of resistive switching properties in RRAM with AlN-Al2O3 bilayer structure

IF 3.6 2区物理与天体物理 Q2 PHYSICS, APPLIED

Applied Physics Letters Pub Date : 2025-07-10 DOI:10.1063/5.0262592

Jinshan He, Xiaoling Duan, Dong Wang, Jiangcheng Wu, Zhihong Liu, Tao Zhang, Yue Hao, Jincheng Zhang

引用次数: 0

Abstract

This study presents the fabrication process and bipolar resistive switching behavior of an Au/Al/AlN/Al2O3/Pt/Ti random-access memory device. The proposed device, incorporating a thin Al2O3 layer between the AlN resistive switching layer and the Pt bottom electrode, exhibits enhanced resistive switching performance. Specifically, the device demonstrates improved endurance, with the number of switching cycles increasing from 122 to 2791, and a higher switching resistance ratio, with the maximum on/off ratio rising from 105 to 108. The enhanced switching stability originates from the inserted Al2O3 layer enabling precise control over conductive filament rupture locations. This spatial regulation yields more stable resistive switching behavior, which is a critical requirement for nonvolatile memory applications.

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AlN-Al2O3双层结构增强RRAM阻性开关性能

本文研究了一种Au/Al/AlN/Al2O3/Pt/Ti随机存取存储器的制备工艺及其双极电阻开关性能。该器件在AlN电阻开关层和Pt底电极之间加入了一层薄薄的Al2O3层，具有增强的电阻开关性能。具体来说，该器件的耐用性得到了提高，开关循环次数从122次增加到2791次，开关电阻比也得到了提高，最大通断比从105次增加到108次。增强的开关稳定性源于插入的Al2O3层，可以精确控制导电丝的破裂位置。这种空间调节产生更稳定的电阻开关行为，这是非易失性存储器应用的关键要求。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

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来源期刊

Applied Physics Letters 物理-物理：应用

CiteScore

6.40

自引率

10.00%

发文量

1821

审稿时长

1.6 months

期刊介绍： Applied Physics Letters (APL) features concise, up-to-date reports on significant new findings in applied physics. Emphasizing rapid dissemination of key data and new physical insights, APL offers prompt publication of new experimental and theoretical papers reporting applications of physics phenomena to all branches of science, engineering, and modern technology. In addition to regular articles, the journal also publishes invited Fast Track, Perspectives, and in-depth Editorials which report on cutting-edge areas in applied physics. APL Perspectives are forward-looking invited letters which highlight recent developments or discoveries. Emphasis is placed on very recent developments, potentially disruptive technologies, open questions and possible solutions. They also include a mini-roadmap detailing where the community should direct efforts in order for the phenomena to be viable for application and the challenges associated with meeting that performance threshold. Perspectives are characterized by personal viewpoints and opinions of recognized experts in the field. Fast Track articles are invited original research articles that report results that are particularly novel and important or provide a significant advancement in an emerging field. Because of the urgency and scientific importance of the work, the peer review process is accelerated. If, during the review process, it becomes apparent that the paper does not meet the Fast Track criterion, it is returned to a normal track.