Photoelektronenspektroskopie-Analytik zur Detektion von oxidativen Chlorschäden an Umkehrosmosemembranen Photoelectron Spectroscopy Analysis for the Detection of Oxidative Chlorine Damage on Reverse Osmosis Membranes

Abstract

Thin-film composite membranes made of polyamide are highly sensitive to oxidizing substances. Membrane damage caused by free chlorine cannot be clearly identified for membrane samples of unknown origin by means of previously used rapid test methods. Usually, membrane damage due to an oxidatively active substance is determined by excluding other potential causes. A photoelectron spectroscopy-based method was developed on reverse osmosis membranes to detect oxidative chlorine damage. The effects and processes of chlorine-induced oxidation damage were determined in connection with the change in the chemical composition of the membrane surface.