An H∞ optimization-based high-gain loop-shaping method for precision motion control of nano-positioning systems

IF 3.7 2区 工程技术 Q2 ENGINEERING, MANUFACTURING
Qi Yu, Yixuan Meng, Xiangyuan Wang, Lingwen Tan, Limin Zhu
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引用次数: 0

Abstract

In this paper, an enhanced high-gain loop-shaping (E-HGLS) method is proposed based on the H optimization design scheme for precision motion control of nano-positioning systems. In the conventional HGLS method, a simple first-order low-pass filter is chosen to generate high control gain due to its simple structure. To improve the performance of the HGLS method, a more sophisticated filter is designed using H based optimization method to provide higher gains across a broader frequency range which can enhance the robust stability, tracking accuracy and disturbance rejection capability. To verify the superiority of the proposed E-HGLS method, comparative experiments are conducted on a nano-positioning system. Experimental results demonstrate that both the maximum tracking error and the root-mean-squared tracking error are reduced significantly as compared with the conventional HGLS method and the proportional-integral controller with the same phase margin. In particular, the maximum tracking error is reduced from 138.8 nm to 64.4 nm as compared with the conventional HGLS method when tracking a 10 Hz sinusoidal trajectory. The E-HGLS method is promising to improve the control performance of high-precision motion systems for nano-positioning applications.
基于H∞优化的高增益环形纳米定位系统精密运动控制方法
本文提出了一种基于H∞优化设计方案的增强型高增益环整形(E-HGLS)方法,用于纳米定位系统的精密运动控制。在传统的HGLS方法中,由于结构简单,采用简单的一阶低通滤波器产生较高的控制增益。为了提高HGLS方法的性能,采用基于H∞的优化方法设计了更复杂的滤波器,在更宽的频率范围内提供更高的增益,从而提高了鲁棒稳定性、跟踪精度和抗干扰能力。为了验证E-HGLS方法的优越性,在一个纳米定位系统上进行了对比实验。实验结果表明,与传统的HGLS方法和具有相同相位裕度的比例积分控制器相比,最大跟踪误差和均方根跟踪误差都有显著降低。特别是,当跟踪10 Hz正弦轨迹时,与传统HGLS方法相比,最大跟踪误差从138.8 nm减小到64.4 nm。E-HGLS方法有望改善纳米定位高精度运动系统的控制性能。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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来源期刊
CiteScore
7.40
自引率
5.60%
发文量
177
审稿时长
46 days
期刊介绍: Precision Engineering - Journal of the International Societies for Precision Engineering and Nanotechnology is devoted to the multidisciplinary study and practice of high accuracy engineering, metrology, and manufacturing. The journal takes an integrated approach to all subjects related to research, design, manufacture, performance validation, and application of high precision machines, instruments, and components, including fundamental and applied research and development in manufacturing processes, fabrication technology, and advanced measurement science. The scope includes precision-engineered systems and supporting metrology over the full range of length scales, from atom-based nanotechnology and advanced lithographic technology to large-scale systems, including optical and radio telescopes and macrometrology.
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