Dilute bismuth incorporated InGaBiAs photodetectors for extended short-wave infrared detection

IF 3.5 2区 物理与天体物理 Q2 PHYSICS, APPLIED
Md Toriqul Islam, Mrudul S. Parasnis, Nuha Ahmed-Babikir, James Bork, Abhilasha Kamboj, Sheikh Alimur Razi, Weipeng Wu, Lars Gundlach, Joshua M. O. Zide, Jamie D. Phillips
{"title":"Dilute bismuth incorporated InGaBiAs photodetectors for extended short-wave infrared detection","authors":"Md Toriqul Islam, Mrudul S. Parasnis, Nuha Ahmed-Babikir, James Bork, Abhilasha Kamboj, Sheikh Alimur Razi, Weipeng Wu, Lars Gundlach, Joshua M. O. Zide, Jamie D. Phillips","doi":"10.1063/5.0273578","DOIUrl":null,"url":null,"abstract":"Dilute bismuth (Bi) incorporated InGaBiAs is a promising material for an extended range of short-wave infrared (e-SWIR, 1.7–2.5 μm wavelength) detection. The InGaBiAs is a highly mismatched semiconductor alloy, where small concentrations of Bi incorporation alter the electronic band structure due to the valence band anti-crossing interaction between Bi states and host InGaAs material, resulting in a decrease in the bandgap energy. In this work, photodetectors based on InGaBiAs alloys lattice matched to InP demonstrate an extension of the cutoff wavelength beyond 2 μm. Dark current density, minority carrier lifetime, and responsivity strongly depend on group-V arsenic overpressure during epitaxial growth. Photodetectors grown under high arsenic flux pressure show low dark current values at room temperature (1.0 × 10−3 A/cm2 at 100 mV reverse bias), an order of magnitude lower than stoichiometric and low As flux grown devices, and correspondingly higher lifetime and responsivity. Two distinct activation energies were identified for each growth condition based on temperature-dependent dark current analysis, with trap-assisted generation-recombination in the depletion region and shallow defect recombination as the dark current-limiting factors in all devices.","PeriodicalId":8094,"journal":{"name":"Applied Physics Letters","volume":"21 1","pages":""},"PeriodicalIF":3.5000,"publicationDate":"2025-07-08","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Applied Physics Letters","FirstCategoryId":"101","ListUrlMain":"https://doi.org/10.1063/5.0273578","RegionNum":2,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q2","JCRName":"PHYSICS, APPLIED","Score":null,"Total":0}
引用次数: 0

Abstract

Dilute bismuth (Bi) incorporated InGaBiAs is a promising material for an extended range of short-wave infrared (e-SWIR, 1.7–2.5 μm wavelength) detection. The InGaBiAs is a highly mismatched semiconductor alloy, where small concentrations of Bi incorporation alter the electronic band structure due to the valence band anti-crossing interaction between Bi states and host InGaAs material, resulting in a decrease in the bandgap energy. In this work, photodetectors based on InGaBiAs alloys lattice matched to InP demonstrate an extension of the cutoff wavelength beyond 2 μm. Dark current density, minority carrier lifetime, and responsivity strongly depend on group-V arsenic overpressure during epitaxial growth. Photodetectors grown under high arsenic flux pressure show low dark current values at room temperature (1.0 × 10−3 A/cm2 at 100 mV reverse bias), an order of magnitude lower than stoichiometric and low As flux grown devices, and correspondingly higher lifetime and responsivity. Two distinct activation energies were identified for each growth condition based on temperature-dependent dark current analysis, with trap-assisted generation-recombination in the depletion region and shallow defect recombination as the dark current-limiting factors in all devices.
稀铋结合InGaBiAs光电探测器扩展短波红外探测
掺入InGaBiAs的稀铋(Bi)是一种很有前途的短波红外(e-SWIR,波长1.7 ~ 2.5 μm)检测材料。InGaAs是一种高度失配的半导体合金,由于Bi态与宿主InGaAs材料之间的价带反交叉相互作用,小浓度的Bi掺入改变了电子带结构,导致带隙能量降低。在这项工作中,基于InGaBiAs合金晶格与InP匹配的光电探测器显示出截止波长超过2 μm的扩展。暗电流密度、少数载流子寿命和响应性在外延生长过程中强烈依赖于v族砷超压。在高砷磁通压力下生长的光电探测器在室温下显示出低暗电流值(在100 mV反向偏置下为1.0 × 10−3 A/cm2),比化学计量学和低砷磁通生长器件低一个数量级,并相应地具有更高的寿命和响应率。基于温度依赖的暗电流分析,每种生长条件下确定了两种不同的活化能,耗尽区阱辅助生成重组和浅缺陷重组是所有器件的暗电流限制因素。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
求助全文
约1分钟内获得全文 求助全文
来源期刊
Applied Physics Letters
Applied Physics Letters 物理-物理:应用
CiteScore
6.40
自引率
10.00%
发文量
1821
审稿时长
1.6 months
期刊介绍: Applied Physics Letters (APL) features concise, up-to-date reports on significant new findings in applied physics. Emphasizing rapid dissemination of key data and new physical insights, APL offers prompt publication of new experimental and theoretical papers reporting applications of physics phenomena to all branches of science, engineering, and modern technology. In addition to regular articles, the journal also publishes invited Fast Track, Perspectives, and in-depth Editorials which report on cutting-edge areas in applied physics. APL Perspectives are forward-looking invited letters which highlight recent developments or discoveries. Emphasis is placed on very recent developments, potentially disruptive technologies, open questions and possible solutions. They also include a mini-roadmap detailing where the community should direct efforts in order for the phenomena to be viable for application and the challenges associated with meeting that performance threshold. Perspectives are characterized by personal viewpoints and opinions of recognized experts in the field. Fast Track articles are invited original research articles that report results that are particularly novel and important or provide a significant advancement in an emerging field. Because of the urgency and scientific importance of the work, the peer review process is accelerated. If, during the review process, it becomes apparent that the paper does not meet the Fast Track criterion, it is returned to a normal track.
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
确定
请完成安全验证×
copy
已复制链接
快去分享给好友吧!
我知道了
右上角分享
点击右上角分享
0
联系我们:info@booksci.cn Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。 Copyright © 2023 布克学术 All rights reserved.
京ICP备2023020795号-1
ghs 京公网安备 11010802042870号
Book学术文献互助
Book学术文献互助群
群 号:604180095
Book学术官方微信