Microwave Annealing-Enabled Defect Healing for High-Performance and Stable Organic Transistors and Circuits.

IF 10.7 2区 材料科学 Q1 CHEMISTRY, PHYSICAL
Yao Fu, Yanpeng Wang, Shougang Sun, Yajing Sun, Jiannan Qi, Yongxu Hu, Shuaishuai Ding, Zhongwu Wang, Yinan Huang, Wenping Hu, Xiaosong Chen, Hui Yang, Liqiang Li
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引用次数: 0

Abstract

Organic field-effect transistors (OFETs) are promising candidates for use in next-generation electronic devices. However, organic semiconductors (OSCs) exhibit low crystallinity and weak van der Waals (vdW) forces, which makes them prone to defect formation, resulting in localized states in the bandgap that can trap charge carriers. This seriously limits the performance and stability of OFETs, which typically exhibit high contact resistance (Rc) and poor operational stability. It is highly desirable, but challenging, to eliminate defects in OSCs. Herein, a microwave annealing strategy is presented that heals defects in OSCs near the electrode/OSC interface through co-associated high-frequency vibration. By using this technique, the trap density of states (DOS) is significantly reduced and coplanar OFETs achieve an ultralow Rc·W of 20 Ω cm and a high mobility of 10.57 cm2 V-1 s-1. Moreover, the on-state current of the OFET retained 99% of its initial value after 10 000 s of constant bias stress, and the switching voltage of the biased-load inverters hardly shifted after cycle tests, demonstrating excellent operational stability. The high-efficiency, uniform heating, and low-temperature processing strategy has great application prospects in organic devices and circuits.

用于高性能稳定有机晶体管和电路的微波退火缺陷修复。
有机场效应晶体管(ofet)是下一代电子器件中很有前途的候选者。然而,有机半导体(OSCs)表现出低结晶度和弱范德华力(vdW),这使得它们容易形成缺陷,导致带隙中的局域态可以捕获载流子。这严重限制了ofet的性能和稳定性,它们通常表现出高接触电阻(Rc)和差的工作稳定性。消除osc中的缺陷是非常可取的,但也是具有挑战性的。本文提出了一种微波退火策略,通过共关联高频振动修复电极/OSC界面附近的OSC缺陷。通过使用该技术,显著降低了陷阱态密度(DOS),共面ofet实现了20 Ω cm的超低Rc·W和10.57 cm2 V-1 s-1的高迁移率。在恒偏置应力10000s后,OFET的导通电流保持在初始值的99%,且经过循环测试,偏载逆变器的开关电压几乎没有移位,表现出良好的运行稳定性。这种高效、均匀加热、低温加工策略在有机器件和电路中具有广阔的应用前景。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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来源期刊
Small Methods
Small Methods Materials Science-General Materials Science
CiteScore
17.40
自引率
1.60%
发文量
347
期刊介绍: Small Methods is a multidisciplinary journal that publishes groundbreaking research on methods relevant to nano- and microscale research. It welcomes contributions from the fields of materials science, biomedical science, chemistry, and physics, showcasing the latest advancements in experimental techniques. With a notable 2022 Impact Factor of 12.4 (Journal Citation Reports, Clarivate Analytics, 2023), Small Methods is recognized for its significant impact on the scientific community. The online ISSN for Small Methods is 2366-9608.
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