Tribological behavior of hydrogenated diamond-like carbon (H-DLC) films from −100 to 200 °C

IF 6.1 1区工程技术 Q1 ENGINEERING, MECHANICAL

Wear Pub Date : 2025-07-04 DOI:10.1016/j.wear.2025.206233

Jie Zhou , Fenghua Su , Jianfang Sun , Zhujun Li , Yifei Liu

引用次数: 0

Abstract

Hydrogenated diamond-like carbon (H-DLC) films have been widely used to protect component surfaces under complex operating conditions. However, the mechanism by which extreme low-temperature environments affect their tribology is not clear. Here, four Cr/WC/H-DLC films with varying C₂H₂/Ar flow ratios were deposited using hybrid magnetron sputtering-PECVD. Results indicate that the gas flow ratio critically governs sp³ C-C bonds formation, directly correlating with enhanced hardness and temperature-resistant friction performance. Optimal C₂H₂/Ar conditions maximized sp³ C-C bonds content, achieving stable wear resistance from −100 °C to 200 °C through adaptive carbon reconfiguration, thereby advancing extreme-environment H-DLC films design strategies.

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氢化类金刚石（H-DLC）膜在−100 ~ 200°C的摩擦学行为

氢化类金刚石（H-DLC）薄膜广泛应用于复杂操作条件下的部件表面保护。然而，极端低温环境影响其摩擦学的机制尚不清楚。本文采用磁控溅射- pecvd混合方法制备了4种不同C2H2/Ar流比的Cr/WC/H-DLC薄膜。结果表明，气体流量比对sp3 C-C键的形成起关键作用，与硬度和耐温摩擦性能的增强直接相关。优化的C2H2/Ar条件使sp3 C-C键含量最大化，通过自适应碳重构实现了从- 100°C到200°C的稳定耐磨性，从而推进了极端环境H-DLC膜的设计策略。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

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来源期刊

Wear 工程技术-材料科学：综合

CiteScore

8.80

自引率

8.00%

发文量

280

审稿时长

47 days

期刊介绍： Wear journal is dedicated to the advancement of basic and applied knowledge concerning the nature of wear of materials. Broadly, topics of interest range from development of fundamental understanding of the mechanisms of wear to innovative solutions to practical engineering problems. Authors of experimental studies are expected to comment on the repeatability of the data, and whenever possible, conduct multiple measurements under similar testing conditions. Further, Wear embraces the highest standards of professional ethics, and the detection of matching content, either in written or graphical form, from other publications by the current authors or by others, may result in rejection.