A review on structure and manufacturing optimization of LDMOS devices

Abstract

Bipolar-CMOS-DMOS (BCD) is the mainstream manufacturing technology for power management integrated circuits (PMIC), with laterally diffused metal-oxide semiconductor (LDMOS) devices serving as the core component. This review provides a comprehensive overview of LDMOS device structures, manufacturing processes, and applications. It discusses the fundamental structure and working principles, encompassing the manufacturing processes, critical technological features, and industry-specific module descriptions. Furthermore, it introduces device optimization strategies

tailored to various application scenarios. By integrating insights from both industry and academia, this review highlights emerging trends and challenges in the field, offering a forward-looking perspective on LDMOS advancements and future research directions.