Effects of defects in graphene on molecular beam epitaxy of CdTe on graphene/Ge

IF 3.5 2区物理与天体物理 Q2 PHYSICS, APPLIED

Applied Physics Letters Pub Date : 2025-07-07 DOI:10.1063/5.0281027

Yanhui Zhang, Haitao Jiang, Zaihong Yang, Liuyan Fan, Ziteng Zhang, Can Zhou, Yajie Wang, Changlin Zheng, Xiaohao Zhou, Pingping Chen

引用次数: 0

Abstract

Perfect graphene substrates can improve the quality of films grown by large-mismatch heteroepitaxy and simultaneously enable the transfer of epitaxial layers. However, large-area chemical vapor deposition-grown graphene suitable for practical applications typically contains various defects, and the influence of these defects on heteroepitaxial growth remains unclear. In this work, we systematically investigated the molecular beam epitaxy growth of CdTe films on graphene/Ge substrates. The effects of graphene defects on the nucleation behavior and crystal structure of CdTe grains were elucidated, and epitaxial models for CdTe on three types of graphene/Ge surfaces were proposed. Furthermore, we evaluated the crystal quality of CdTe films grown on different graphene/Ge substrates and found that the quality of the epitaxial films is strongly correlated with the defects in graphene.

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石墨烯缺陷对CdTe在石墨烯/锗上分子束外延的影响

完美的石墨烯衬底可以提高大错配异质外延生长薄膜的质量，同时实现外延层的转移。然而，适合实际应用的大面积化学气相沉积生长石墨烯通常含有各种缺陷，这些缺陷对异质外延生长的影响尚不清楚。在这项工作中，我们系统地研究了CdTe薄膜在石墨烯/锗衬底上的分子束外延生长。研究了石墨烯缺陷对CdTe晶粒成核行为和晶体结构的影响，提出了三种类型的石墨烯/锗表面上CdTe的外延模型。此外，我们评估了在不同石墨烯/锗衬底上生长的CdTe薄膜的晶体质量，发现外延薄膜的质量与石墨烯中的缺陷密切相关。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

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来源期刊

Applied Physics Letters 物理-物理：应用

CiteScore

6.40

自引率

10.00%

发文量

1821

审稿时长

1.6 months

期刊介绍： Applied Physics Letters (APL) features concise, up-to-date reports on significant new findings in applied physics. Emphasizing rapid dissemination of key data and new physical insights, APL offers prompt publication of new experimental and theoretical papers reporting applications of physics phenomena to all branches of science, engineering, and modern technology. In addition to regular articles, the journal also publishes invited Fast Track, Perspectives, and in-depth Editorials which report on cutting-edge areas in applied physics. APL Perspectives are forward-looking invited letters which highlight recent developments or discoveries. Emphasis is placed on very recent developments, potentially disruptive technologies, open questions and possible solutions. They also include a mini-roadmap detailing where the community should direct efforts in order for the phenomena to be viable for application and the challenges associated with meeting that performance threshold. Perspectives are characterized by personal viewpoints and opinions of recognized experts in the field. Fast Track articles are invited original research articles that report results that are particularly novel and important or provide a significant advancement in an emerging field. Because of the urgency and scientific importance of the work, the peer review process is accelerated. If, during the review process, it becomes apparent that the paper does not meet the Fast Track criterion, it is returned to a normal track.