Graphene patterning without plasma etching via SU-8 pattern peel-off.

IF 3.8 2区综合性期刊 Q1 MULTIDISCIPLINARY SCIENCES

Scientific Reports Pub Date : 2025-07-04 DOI:10.1038/s41598-025-08895-2

Maryam Riyahi, Gholam-Mohammad Parsanasab, Mohammad Sabaeian

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引用次数: 0

Abstract

Although graphene has made its way into many areas of science and technology, proper tools for patterning graphene are not available to all researchers. Therefore, any new patterning method is useful. This research investigates the patterning of graphene layers on [Formula: see text] substrates via the use of an SU-8 photoresist to produce micrometer-sized components such as electrodes. The new method is based on the sufficient adhesion of graphene to SU-8 after SU-8 cross-linking. First, SU-8 photolithography in the inverse form of the final pattern is carried out on the graphene layer. Then, both the SU-8 pattern and the graphene part attached to it are simultaneously removed, resulting in the final graphene pattern. This method can also be extended in a way that is compatible with imprint lithography, as its framework is described in this paper. In this way, the non-crosslinked SU-8 in the inverse pattern is transferred to the graphene layer via a premade stamp. This latter approach could benefit from the complete elimination of SU-8 effects, especially SU-8 contamination, from the final graphene pattern, as well as the simplicity of replication for mass production.

查看原文本刊更多论文

通过SU-8模式剥离无等离子蚀刻的石墨烯模式。

尽管石墨烯已经进入了许多科学和技术领域，但并不是所有的研究人员都可以使用合适的工具来绘制石墨烯的图案。因此，任何新的图案化方法都是有用的。这项研究通过使用SU-8光刻胶来生产微米尺寸的元件，如电极，研究了石墨烯层在[公式：见文本]衬底上的图案。新方法是基于SU-8交联后石墨烯与SU-8的充分粘附。首先，在石墨烯层上进行与最终图案相反形式的SU-8光刻。然后，SU-8图案和附着在其上的石墨烯部分同时被去除，从而得到最终的石墨烯图案。这种方法也可以扩展到与压印光刻兼容的方式，因为它的框架在本文中被描述。通过这种方式，非交联的SU-8在反向图案中通过预先制作的印记转移到石墨烯层。后一种方法可以从最终的石墨烯图案中完全消除SU-8效应，特别是SU-8污染，以及大规模生产的简单复制中受益。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

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来源期刊

Scientific Reports Natural Science Disciplines-

CiteScore

7.50

自引率

4.30%

发文量

19567

审稿时长

3.9 months

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