Manipulating Charged Domain Wall Arrays in BiFeO3 Films by Asymmetric Electrical Boundary Conditions.

IF 15.8 1区 材料科学 Q1 CHEMISTRY, MULTIDISCIPLINARY
ACS Nano Pub Date : 2025-07-04 DOI:10.1021/acsnano.5c06742
Wen-Wen Fan, Shuang-Jie Chen, Li-Xin Yang, ChangJi Li, Jiaqi Liu, Yu-Jia Wang, Yin-Lian Zhu, Xiu-Liang Ma, Yun-Long Tang
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引用次数: 0

Abstract

Charged domain walls (CDWs) in ferroelectric thin films have been identified as reconfigurable functional elements for advanced nanoelectronics, owing to their enhanced electrical conductivity and field-tunable topology. Deterministic control of stable CDWs remains a critical challenge due to insufficient understanding of their atomic-scale mechanisms. Here, we present a method for controllable introduction of CDWs in BiFeO3 thin films. By making use of atom resolved scanning transmission electron microscopy (STEM), we specified the stabilization principle of head-to-head and tail-to-tail CDW arrays in ultrathin BiFeO3 epitaxial films governed by asymmetric electrical boundary conditions, which were grown on SrTiO3 substrates. Atomic scale analysis of the lattice parameters and Fe ion displacements show distinct structural responses at head-to-head and tail-to-tail CDWs. Specifically, a reduction of in-plane lattice constant was observed at head-to-head CDWs, whereas an increase of in-plane lattice constant was identified at tail-to-tail CDWs. Moreover, the in-plane Fe ion displacements exhibit a continuous and periodic variation along the alternating head-to-head and tail-to-tail CDWs. These phenomena are governed by interfacial screening charge asymmetry, which plays a crucial role in stabilizing CDW arrays in dimensionally confined ferroelectrics. Our study advances the manipulation of interfacial screening and polarizations of ferroelectric films, facilitating the development of domain-wall-based nanoelectronic devices.

利用非对称电边界条件操纵BiFeO3薄膜中的带电畴壁阵列。
铁电薄膜中的带电畴壁(CDWs)由于其增强的电导率和场可调谐的拓扑结构,已被确定为先进纳米电子学的可重构功能元件。稳定cdw的确定性控制仍然是一个关键的挑战,因为对其原子尺度机制的理解不足。本文提出了一种在BiFeO3薄膜中可控引入cdw的方法。利用原子分辨扫描透射电子显微镜(STEM),我们明确了在SrTiO3衬底上生长的由不对称电边界条件控制的超薄BiFeO3外延膜中头对头和尾对尾CDW阵列的稳定原理。晶格参数和铁离子位移的原子尺度分析表明,在头对头和尾对尾的CDWs中有明显的结构响应。具体来说,在头对头的cdw中观察到面内晶格常数的减少,而在尾对尾的cdw中发现了面内晶格常数的增加。此外,平面内的铁离子位移沿交替的头对头和尾对尾的cdw表现出连续的周期性变化。这些现象是由界面屏蔽电荷不对称控制的,它在尺寸受限的铁电体中稳定CDW阵列起着至关重要的作用。我们的研究促进了铁电薄膜的界面筛选和极化操作,促进了基于畴壁的纳米电子器件的发展。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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来源期刊
ACS Nano
ACS Nano 工程技术-材料科学:综合
CiteScore
26.00
自引率
4.10%
发文量
1627
审稿时长
1.7 months
期刊介绍: ACS Nano, published monthly, serves as an international forum for comprehensive articles on nanoscience and nanotechnology research at the intersections of chemistry, biology, materials science, physics, and engineering. The journal fosters communication among scientists in these communities, facilitating collaboration, new research opportunities, and advancements through discoveries. ACS Nano covers synthesis, assembly, characterization, theory, and simulation of nanostructures, nanobiotechnology, nanofabrication, methods and tools for nanoscience and nanotechnology, and self- and directed-assembly. Alongside original research articles, it offers thorough reviews, perspectives on cutting-edge research, and discussions envisioning the future of nanoscience and nanotechnology.
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