Deposition of Tin Catalysts from Thiolated Precursor Organic Solutions for CO2 Reduction to Formate: A Potential-Dependent Mechanism Study.

IF 3 4区 化学 Q2 CHEMISTRY, MULTIDISCIPLINARY
Yaron Cohen, Sumesh Sadhujan, Sonal Rajput, Yakov Shitrit, Olga Iliashevsky
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引用次数: 0

Abstract

The production of efficient catalysts is mandatory to attain superior catalytic performance. Once the catalyst deposition mechanism is clear, one can define the optimal physical and chemical conditions of the deposition process, such as electrolyte composition, reduction potential, current operation mode, result chemical composition of the catalyst, its structure and morphology. Here, we investigate the electrodeposition mechanism of tin catalysts in dimethyformamide of a thiolated tin complex under potential control for CO2 reduction to formate. First, a new synthesis route is presented for a tin thiolate precursor, Bis(1,2-ethanedihiolate)Sn(IV). Second, a potential-controlled deposition process of tin from dimethylformamide solutions of this precursor is discussed, with the intention to deposition of tin catalysts on acid-sensitive substrates, such as carbon-composed gas-diffusion-layers. We expose with scan-rate cyclic-voltammetry, scan-rate mass-potential and chronoamperometry measurements irregular current-potential and mass change phenomena along electrodeposition, which reflect a complicated potential-dependent mechanism composed of redox and chemical reactions. Disproportionation and comproportionation reactions of tin are indicated by the holistic picture of the potential and time -dependent mass measurements and complementary structure and morphology analysis and are suggested to have an important role in the deposition mechanism of tin. The complex mechanism is untied and the deposition conditions are defined accordingly.

硫代前驱体有机溶液沉积锡催化剂用于CO2还原为甲酸盐:电位依赖机理研究。
生产高效的催化剂是获得优异催化性能的必要条件。一旦明确了催化剂的沉积机理,就可以确定沉积过程的最佳物理和化学条件,如电解质组成、还原电位、电流操作方式、催化剂的结果化学组成、结构和形态。本文在电位控制下,研究了锡催化剂在硫代锡配合物二甲甲酰胺中的电沉积机理,以使CO2还原为甲酸盐。首先,提出了一种新的锡硫酸前驱体Bis(1,2-乙二酸酯)Sn(IV)的合成方法。其次,讨论了从该前驱体的二甲基甲酰胺溶液中沉积锡的电位控制工艺,目的是将锡催化剂沉积在酸敏感的衬底上,如碳组成的气体扩散层。通过扫描速率循环伏安法、扫描速率质量电位法和计时电流法的测量,揭示了电沉积过程中不规则的电流电位和质量变化现象,这些现象反映了由氧化还原和化学反应组成的复杂的电位依赖机制。电势和时间相关的质量测量和互补的结构和形态分析表明锡的歧化和比例反应在锡的沉积机制中起着重要作用。解开了复杂的机理,并据此确定了沉积条件。
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来源期刊
ChemPlusChem
ChemPlusChem CHEMISTRY, MULTIDISCIPLINARY-
CiteScore
5.90
自引率
0.00%
发文量
200
审稿时长
1 months
期刊介绍: ChemPlusChem is a peer-reviewed, general chemistry journal that brings readers the very best in multidisciplinary research centering on chemistry. It is published on behalf of Chemistry Europe, an association of 16 European chemical societies. Fully comprehensive in its scope, ChemPlusChem publishes articles covering new results from at least two different aspects (subfields) of chemistry or one of chemistry and one of another scientific discipline (one chemistry topic plus another one, hence the title ChemPlusChem). All suitable submissions undergo balanced peer review by experts in the field to ensure the highest quality, originality, relevance, significance, and validity.
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