Multi-strategy optimization model based on continuous cellular automaton and particle swarm optimization for controlling sputter etched profiles by focused ion beam

Abstract

With the development of micro-nano-scale devices, the precise manufacturing of complex topographies using focused ion beam (FIB) sputter etching has become an indispensable process requirement. The fabrication of curved micro-nano structures primarily employs bitmaps and stream files. However, due to the influence of complex effects, it is challenging to directly ascertain the process parameters. Therefore, this paper intensively analyzes the FIB manufacturing method, focusing specifically on the control methodology of bitmaps and stream files in the production of complex structures. Furthermore, the multi-strategy optimization model based on CCA-PSO (Continuous Cellular Automaton & Particle Swarm Optimization) is proposed, integrating simulation and optimization techniques to acquire process parameters and enhance manufacturing accuracy. The model leverages the characteristics of FIB sputter etching, simplifying the solution space, optimizing the search method, and increasing the iteration rate. Additionally, various complex structure manufacturing experiments were designed to validate the model's effectiveness and rationality. The advantages and limitations of the optimization methods and the three strategies are elaborated in detail, and their application in real manufacturing scenarios is also discussed, providing a reference for the further application of FIB manufacturing technology.