Synthesis and characterization of β-Ga2O3 nanowires on 4H-SiC substrates via Au-catalyzed low-pressure chemical vapor deposition

IF 2 4区 材料科学 Q3 CRYSTALLOGRAPHY
Jichao Hu , Qi Zhang , Yao Li , Bei Xu , Bo Peng , Linpeng Dong , Lei Yuan , Yuan Yang , Xiaomin He
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引用次数: 0

Abstract

In this paper, we synthesized β-Ga2O3 nanowires on 4H-SiC substrates via Low-Pressure Chemical Vapor Deposition (LPCVD) with Au as a catalyst. Au nanofilms of varying thicknesses (0–40 nm) were sputtered onto 4H-SiC substrates, followed by thermal treatment at 1000 °C. The morphological characteristics of the resultant β-Ga2O3 nanowires were systematically examined as a function of Au nanofilm thickness, facilitating a comprehensive analysis of the underlying growth mechanisms. The study elucidated the correlation between catalyst film thickness and nanowire formation dynamics during LPCVD synthesis. Results demonstrated that decreasing Au nanofilm thickness corresponds to β-Ga2O3 nanowires with reduced diameters, while simultaneously inhibiting the formation of columnar and lamellar nanostructures.
金催化低压化学气相沉积在4H-SiC衬底上合成β-Ga2O3纳米线及表征
本文以Au为催化剂,采用低压化学气相沉积(LPCVD)技术在4H-SiC衬底上合成了β-Ga2O3纳米线。将不同厚度(0-40 nm)的金纳米膜溅射到4H-SiC衬底上,然后在1000℃下进行热处理。研究人员系统地研究了β-Ga2O3纳米线的形态特征与Au纳米膜厚度的关系,从而全面分析了其潜在的生长机制。研究阐明了LPCVD合成过程中催化剂膜厚度与纳米线形成动力学的关系。结果表明,减小Au纳米膜厚度对应于减小β-Ga2O3纳米线直径,同时抑制柱状和片层状纳米结构的形成。
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来源期刊
Journal of Crystal Growth
Journal of Crystal Growth 化学-晶体学
CiteScore
3.60
自引率
11.10%
发文量
373
审稿时长
65 days
期刊介绍: The journal offers a common reference and publication source for workers engaged in research on the experimental and theoretical aspects of crystal growth and its applications, e.g. in devices. Experimental and theoretical contributions are published in the following fields: theory of nucleation and growth, molecular kinetics and transport phenomena, crystallization in viscous media such as polymers and glasses; crystal growth of metals, minerals, semiconductors, superconductors, magnetics, inorganic, organic and biological substances in bulk or as thin films; molecular beam epitaxy, chemical vapor deposition, growth of III-V and II-VI and other semiconductors; characterization of single crystals by physical and chemical methods; apparatus, instrumentation and techniques for crystal growth, and purification methods; multilayer heterostructures and their characterisation with an emphasis on crystal growth and epitaxial aspects of electronic materials. A special feature of the journal is the periodic inclusion of proceedings of symposia and conferences on relevant aspects of crystal growth.
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