Thermal diffusion-driven formation of CuSbS2 from Co-evaporated Cu and Sb2S3 for photovoltaics

IF 3.9 2区材料科学 Q2 MATERIALS SCIENCE, MULTIDISCIPLINARY

Vacuum Pub Date : 2025-06-29 DOI:10.1016/j.vacuum.2025.114549

S. Heera, A. Sujith, K.G. Deepa

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引用次数: 0

Abstract

CuSbS₂ is an emerging, earth-abundant material with strong potential as a solar cell absorber. In this work, CuSbS₂ thin films are prepared by diffusing copper into antimony trisulphide (Sb₂S₃) through co-evaporation under low-pressure conditions, and their application in solar cells is demonstrated. The as-deposited samples are amorphous in nature, and their crystallinity improved with thermal treatment at various temperatures, reaching a maximum at 375 °C. The sample composition is varied to determine the optimal stoichiometry achievable with the current deposition method. All the samples exhibited sulfur-poor stoichiometry, and selenium doping is employed to compensate for the sulfur deficiency in the material. The conductivity of the CuSbS₂ film improved upon doping with a small amount of Se. Solar cell is fabricated in the configuration Au/p-CuSbS₂/n-Si/Al using both doped and undoped CuSbS₂. The conversion efficiency improved from 0.15 to 0.7 % with Se doping.

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热扩散驱动下Cu和Sb2S3共蒸发形成CuSbS2的研究

CuSbS2是一种新兴的、储量丰富的材料，作为太阳能电池吸收剂具有很强的潜力。本文在低压条件下，通过共蒸发将铜扩散到三硫化锑（Sb2S3）中，制备了CuSbS2薄膜，并展示了其在太阳能电池中的应用。沉积样品本质上是无定形的，在不同温度下进行热处理，其结晶度得到改善，在375℃时达到最大值。改变样品组成以确定当前沉积方法可实现的最佳化学计量。所有样品都表现出贫硫化学计量，并采用硒掺杂来补偿材料中的缺硫。在CuSbS2薄膜中掺入少量硒后，其导电性得到改善。采用掺杂和未掺杂CuSbS2制备了Au/p-CuSbS2/n-Si/Al结构的太阳能电池。硒的掺入使转换效率从0.15提高到0.7%。

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来源期刊

Vacuum 工程技术-材料科学：综合

CiteScore

6.80

自引率

17.50%

发文量

审稿时长

34 days

期刊介绍： Vacuum is an international rapid publications journal with a focus on short communication. All papers are peer-reviewed, with the review process for short communication geared towards very fast turnaround times. The journal also published full research papers, thematic issues and selected papers from leading conferences. A report in Vacuum should represent a major advance in an area that involves a controlled environment at pressures of one atmosphere or below. The scope of the journal includes: 1. Vacuum; original developments in vacuum pumping and instrumentation, vacuum measurement, vacuum gas dynamics, gas-surface interactions, surface treatment for UHV applications and low outgassing, vacuum melting, sintering, and vacuum metrology. Technology and solutions for large-scale facilities (e.g., particle accelerators and fusion devices). New instrumentation ( e.g., detectors and electron microscopes). 2. Plasma science; advances in PVD, CVD, plasma-assisted CVD, ion sources, deposition processes and analysis. 3. Surface science; surface engineering, surface chemistry, surface analysis, crystal growth, ion-surface interactions and etching, nanometer-scale processing, surface modification. 4. Materials science; novel functional or structural materials. Metals, ceramics, and polymers. Experiments, simulations, and modelling for understanding structure-property relationships. Thin films and coatings. Nanostructures and ion implantation.