Metal-Support Interaction Induced Electron Localization in Rationally Designed Metal Sites Anchored MXene Enables Boosted Electromagnetic Wave Attenuation.
Xiao Wang,Gaolei Dong,Fei Pan,Cong Lin,Bin Yuan,Yang Yang,Wei Lu
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引用次数: 0
Abstract
The electron localization is considered as a promising approach to optimize electromagnetic waves (EMW) dissipation. However, it is still difficult to realize well-controlled electron localization and elucidate the related EMW loss mechanisms for current researches. In this study, a novel two-dimensional MXene (Ti3C2Tx) nanosheet decorated with Ni nanoclusters (Ni-NC) system to construct an effective electron localization model based on electronic orbital structure is explored. Theoretical simulations and experimental results reveal that the metal-support interaction between Ni-NC and MXene disrupts symmetric electronic environments, leading to enhanced electron localization and dipole polarization. Additionally, Ni-NC generate a strong interfacial electric field, strengthening heterointerface interactions and promoting interfacial polarization. As a result, the optimized material achieves an exceptional reflection loss (RLmin) of - 54 dB and a broad effective absorption bandwidth of 6.8 GHz. This study offers critical insights into the in-depth relationship between electron localization and EMW dissipation, providing a pathway for electron localization engineering in functional materials such as semiconductors, spintronics, and catalysis.
期刊介绍:
Nano-Micro Letters is a peer-reviewed, international, interdisciplinary, and open-access journal published under the SpringerOpen brand.
Nano-Micro Letters focuses on the science, experiments, engineering, technologies, and applications of nano- or microscale structures and systems in various fields such as physics, chemistry, biology, material science, and pharmacy.It also explores the expanding interfaces between these fields.
Nano-Micro Letters particularly emphasizes the bottom-up approach in the length scale from nano to micro. This approach is crucial for achieving industrial applications in nanotechnology, as it involves the assembly, modification, and control of nanostructures on a microscale.