Gas-refractometry-based high resolution continuous measurements in a medium vacuum

IF 3.8 2区材料科学 Q2 MATERIALS SCIENCE, MULTIDISCIPLINARY

Vacuum Pub Date : 2025-06-20 DOI:10.1016/j.vacuum.2025.114524

Dong Fan , Detian Li , Zhenhua Xi , Kun Liu , Wenjie Jia , Yongjun Cheng , Wenxi Zhang

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引用次数: 0

Abstract

While an optical vacuum pressure standard (OVPS) using gas refractometry accurately offers a wide pressure measurement range, the measurement accuracy in the medium vacuum range is restricted by various factors. In this study, an optical vacuum pressure standard based on the refractive index measurement of gas in a Fabry-Perot (FP) cavity was developed. The measurement pressures from OVPS and the capacitance diaphragm gauge (CDG) were compared in the medium vacuum range of 4 Pa∼130 Pa. The relative differences between the two measurements ranged from 0.01 % to 0.835 %, with reproducibility relative differences ranging from 0.0323 % to 1.19 %. These results were achieved using argon gas properties. Furthermore, a high-gain, low-noise frequency measurement system based on a rubidium atomic clock frequency reference was constructed to realize the accurate measurement of beat frequency, and the argon pressure resolution was verified to be less than 5 mPa. Finally, this paper also considered the factors influencing the uncertainty of medium vacuum measurements and proposed corresponding solutions. The uncertainty of the OVPS was evaluated to be [(31 mPa)²+(77 × 10⁻⁶p)²]^1/2 (k = 2).

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介质真空中基于气体折射法的高分辨率连续测量

采用气体折射法的光学真空压力标准（OVPS）可以精确地提供较宽的压力测量范围，但在中真空范围内的测量精度受到各种因素的限制。本文研制了一种基于法布里-珀罗（FP）腔内气体折射率测量的光学真空压力标准。在4 Pa ~ 130 Pa的介质真空范围内，比较了OVPS和电容膜片计（CDG）的测量压力。两种方法的相对差异为0.01% ~ 0.835%，重现性相对差异为0.0323% ~ 1.19%。这些结果是利用氩气的特性得到的。在此基础上，构建了基于铷原子钟频率基准的高增益、低噪声频率测量系统，实现了热压频率的精确测量，并验证了氩气压力分辨率小于5 mPa。最后，本文还考虑了影响介质真空测量不确定度的因素，并提出了相应的解决方案。OVPS的不确定度为[(31 mPa)2+(77 × 10−6p)2]1/2 （k = 2）。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

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来源期刊

Vacuum 工程技术-材料科学：综合

CiteScore

6.80

自引率

17.50%

发文量

审稿时长

34 days

期刊介绍： Vacuum is an international rapid publications journal with a focus on short communication. All papers are peer-reviewed, with the review process for short communication geared towards very fast turnaround times. The journal also published full research papers, thematic issues and selected papers from leading conferences. A report in Vacuum should represent a major advance in an area that involves a controlled environment at pressures of one atmosphere or below. The scope of the journal includes: 1. Vacuum; original developments in vacuum pumping and instrumentation, vacuum measurement, vacuum gas dynamics, gas-surface interactions, surface treatment for UHV applications and low outgassing, vacuum melting, sintering, and vacuum metrology. Technology and solutions for large-scale facilities (e.g., particle accelerators and fusion devices). New instrumentation ( e.g., detectors and electron microscopes). 2. Plasma science; advances in PVD, CVD, plasma-assisted CVD, ion sources, deposition processes and analysis. 3. Surface science; surface engineering, surface chemistry, surface analysis, crystal growth, ion-surface interactions and etching, nanometer-scale processing, surface modification. 4. Materials science; novel functional or structural materials. Metals, ceramics, and polymers. Experiments, simulations, and modelling for understanding structure-property relationships. Thin films and coatings. Nanostructures and ion implantation.