Intrinsic spin transport in a topological insulator thin film

IF 3.6 2区 物理与天体物理 Q2 PHYSICS, APPLIED
Sharadh Jois, Gregory M. Stephen, Nicholas A. Blumenschein, Patrick J. Taylor, Aubrey T. Hanbicki, Adam L. Friedman
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引用次数: 0

Abstract

Topological insulators (TIs) are intriguing materials for advanced computing applications based on spintronics because they can host robust spin effects. For instance, TIs have intrinsically large spin generation enabled by their large spin–orbit coupling. Furthermore, topological surface states (TSS) with spin-momentum locking and Dirac dispersion lead to long spin diffusion. Future spintronic device technology will require scalable film growth of high-quality material. We grow epitaxial films of (Bi1−xSbx)2Te3−ySey (BSTS, x = 0.58, y = 1) and confirm the gapless band structure with optimal doping using angle-resolved photoemission spectroscopy. The temperature dependence of the longitudinal resistivity shows that bulk transport is suppressed as the temperature is decreased, and at low temperature, surface transport dominates. We evaluate the spin transport properties in BSTS without using ferromagnetic tunnel contacts via a non-local resistance experiment as a function of temperature and applied charge current. As expected, these experiments reveal the necessity of decreasing the bulk conduction to best enhance the spin transport. In the TSS, we find a charge-to-spin conversion efficiency (spin Hall angle, θSH∼1) and spin diffusion over several micrometers. Further development of high-quality TIs will make them viable candidates for efficient and lossless spintronics.
拓扑绝缘体薄膜的本征自旋输运
拓扑绝缘体(TIs)是基于自旋电子学的先进计算应用的有趣材料,因为它们可以承载强大的自旋效应。例如,由于其大的自旋-轨道耦合,它具有本质上大的自旋生成。此外,具有自旋动量锁定和狄拉克色散的拓扑表面态(TSS)导致了长自旋扩散。未来的自旋电子器件技术将需要高质量的可伸缩薄膜生长材料。我们生长了(Bi1−xSbx)2Te3−ySey (BSTS, x = 0.58, y = 1)外延薄膜,并利用角分辨光谱学证实了最佳掺杂的无间隙带结构。纵向电阻率的温度依赖性表明,随着温度的降低,体输运受到抑制,在低温时,表面输运占主导地位。我们通过非局部电阻实验评估了在不使用铁磁隧道接触的情况下BSTS的自旋输运特性,并将其作为温度和外加电荷电流的函数。正如预期的那样,这些实验揭示了减小体导电性以最好地增强自旋输运的必要性。在TSS中,我们发现了电荷到自旋的转换效率(自旋霍尔角,θSH ~ 1)和几微米范围内的自旋扩散。高质量ti的进一步发展将使它们成为高效无损自旋电子学的可行候选者。
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来源期刊
Applied Physics Letters
Applied Physics Letters 物理-物理:应用
CiteScore
6.40
自引率
10.00%
发文量
1821
审稿时长
1.6 months
期刊介绍: Applied Physics Letters (APL) features concise, up-to-date reports on significant new findings in applied physics. Emphasizing rapid dissemination of key data and new physical insights, APL offers prompt publication of new experimental and theoretical papers reporting applications of physics phenomena to all branches of science, engineering, and modern technology. In addition to regular articles, the journal also publishes invited Fast Track, Perspectives, and in-depth Editorials which report on cutting-edge areas in applied physics. APL Perspectives are forward-looking invited letters which highlight recent developments or discoveries. Emphasis is placed on very recent developments, potentially disruptive technologies, open questions and possible solutions. They also include a mini-roadmap detailing where the community should direct efforts in order for the phenomena to be viable for application and the challenges associated with meeting that performance threshold. Perspectives are characterized by personal viewpoints and opinions of recognized experts in the field. Fast Track articles are invited original research articles that report results that are particularly novel and important or provide a significant advancement in an emerging field. Because of the urgency and scientific importance of the work, the peer review process is accelerated. If, during the review process, it becomes apparent that the paper does not meet the Fast Track criterion, it is returned to a normal track.
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