Lifang Li , Dingkun Gao , Huazhi Chen , Yun Chen , Jihong Yan
{"title":"Development and characterization of a large-scale high-vacuum environment simulation device with ten-kilogram-scale micron-sized lunar dust","authors":"Lifang Li , Dingkun Gao , Huazhi Chen , Yun Chen , Jihong Yan","doi":"10.1016/j.vacuum.2025.114488","DOIUrl":null,"url":null,"abstract":"<div><div>As lunar exploration missions progress, simulation chambers that accurately replicate the lunar environment are becoming essential. These chambers play a crucial role in studying the physical and chemical properties of the lunar surface, as well as in calibrating and evaluating detector reliability. However, current lunar environment simulators face significant challenges in effectively recreating the conditions of lunar dust. In response, we have developed a novel lunar environment simulation apparatus that focuses on improving vacuum performance in dusty conditions. We propose a vacuum experimental protocol specifically designed for the unique dust conditions found on the lunar surface and have validated its reliability through several experiments. Our results show that the system achieves a vacuum level of 10<sup>−5</sup> Pa under simulated kilogram-scale lunar dust conditions, meeting established standards. This work offers more realistic and reliable experimental conditions for lunar exploration, making a substantial contribution to the advancement of lunar environmental studies.</div></div>","PeriodicalId":23559,"journal":{"name":"Vacuum","volume":"240 ","pages":"Article 114488"},"PeriodicalIF":3.8000,"publicationDate":"2025-06-10","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Vacuum","FirstCategoryId":"88","ListUrlMain":"https://www.sciencedirect.com/science/article/pii/S0042207X25004786","RegionNum":2,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q2","JCRName":"MATERIALS SCIENCE, MULTIDISCIPLINARY","Score":null,"Total":0}
引用次数: 0
Abstract
As lunar exploration missions progress, simulation chambers that accurately replicate the lunar environment are becoming essential. These chambers play a crucial role in studying the physical and chemical properties of the lunar surface, as well as in calibrating and evaluating detector reliability. However, current lunar environment simulators face significant challenges in effectively recreating the conditions of lunar dust. In response, we have developed a novel lunar environment simulation apparatus that focuses on improving vacuum performance in dusty conditions. We propose a vacuum experimental protocol specifically designed for the unique dust conditions found on the lunar surface and have validated its reliability through several experiments. Our results show that the system achieves a vacuum level of 10−5 Pa under simulated kilogram-scale lunar dust conditions, meeting established standards. This work offers more realistic and reliable experimental conditions for lunar exploration, making a substantial contribution to the advancement of lunar environmental studies.
期刊介绍:
Vacuum is an international rapid publications journal with a focus on short communication. All papers are peer-reviewed, with the review process for short communication geared towards very fast turnaround times. The journal also published full research papers, thematic issues and selected papers from leading conferences.
A report in Vacuum should represent a major advance in an area that involves a controlled environment at pressures of one atmosphere or below.
The scope of the journal includes:
1. Vacuum; original developments in vacuum pumping and instrumentation, vacuum measurement, vacuum gas dynamics, gas-surface interactions, surface treatment for UHV applications and low outgassing, vacuum melting, sintering, and vacuum metrology. Technology and solutions for large-scale facilities (e.g., particle accelerators and fusion devices). New instrumentation ( e.g., detectors and electron microscopes).
2. Plasma science; advances in PVD, CVD, plasma-assisted CVD, ion sources, deposition processes and analysis.
3. Surface science; surface engineering, surface chemistry, surface analysis, crystal growth, ion-surface interactions and etching, nanometer-scale processing, surface modification.
4. Materials science; novel functional or structural materials. Metals, ceramics, and polymers. Experiments, simulations, and modelling for understanding structure-property relationships. Thin films and coatings. Nanostructures and ion implantation.