Effective Interfacial Bubble Elimination in 2D Heterostructures via Atomic Force Microscope

IF 5.5 2区材料科学 Q2 MATERIALS SCIENCE, MULTIDISCIPLINARY

ACS Applied Nano Materials Pub Date : 2025-06-06 DOI:10.1021/acsanm.5c0170410.1021/acsanm.5c01704

Mengqi Wu, Xiaolei Ding, Minghao An, Lin Liu, Xiaorui Zheng* and Huan Hu*,

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Abstract

Two-dimensional (2D) heterostructures hold significant promise in electronics and photonics. However, bubbles that spontaneously form at the interface between two crystals often degrade the performance of electronic devices. Atomic force microscopy (AFM) offers a direct method for bubble removal in contact mode, but the efficiency of this method varies widely across different substrates, and the removal mechanism is unclear. In this study, we use a nanospherical AFM tip to remove bubbles at the interface between monolayer MoS₂ and three crystals, including hexagonal boron nitride (hBN), silicon dioxide (SiO₂), and etched SiO₂ substrates. The average bubble elimination ratios are 90.0, 80.7, and 14.4% for hBN, SiO₂, and etched SiO₂, respectively. This substrate-dependent difference is related to the interfacial adhesion energy rather than the surface roughness of the substrate. Given the similar aspect ratio of bubbles, the yield of bubble elimination is inversely proportional to the adhesion energy, which can be used to predict the efficiency of bubble elimination using an AFM tip and provides valuable guidance for the fabrication of 2D heterostructures with clean interfaces.

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原子力显微镜下二维异质结构界面气泡的有效消除

二维异质结构在电子学和光子学中具有重要的应用前景。然而，在两个晶体之间的界面上自发形成的气泡往往会降低电子设备的性能。原子力显微镜（AFM）提供了一种在接触模式下去除气泡的直接方法，但这种方法的效率在不同的衬底上差异很大，而且去除机制尚不清楚。在这项研究中，我们使用纳米球形AFM尖端去除单层MoS2与三种晶体（包括六方氮化硼（hBN），二氧化硅（SiO2）和蚀刻SiO2衬底）之间的界面上的气泡。hBN、SiO2和蚀刻SiO2的平均气泡消除率分别为90.0、80.7和14.4%。这种基材相关的差异与界面粘附能有关，而不是基材的表面粗糙度。在气泡宽高比相似的情况下，气泡消除产率与粘附能成反比，可用于预测AFM尖端的气泡消除效率，并为具有清洁界面的二维异质结构的制造提供有价值的指导。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

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来源期刊

ACS Applied Nano Materials Multiple-

CiteScore

8.30

自引率

3.40%

发文量

1601

期刊介绍： ACS Applied Nano Materials is an interdisciplinary journal publishing original research covering all aspects of engineering, chemistry, physics and biology relevant to applications of nanomaterials. The journal is devoted to reports of new and original experimental and theoretical research of an applied nature that integrate knowledge in the areas of materials, engineering, physics, bioscience, and chemistry into important applications of nanomaterials.