Sk Kalimuddin, Biswajit Das, Sudipta Chatterjee, Arnab Bera, Satyabrata Bera, KalyanKumar Chattopadhyay* and Mintu Mondal*,
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引用次数: 0
Abstract
Topological insulators (TIs) with symmetry-protected surface states offer exciting opportunities for next-generation photonic and optoelectronic device applications. The heterojunctions of TIs and semiconductors (e.g., Si and Ge) have been observed to exhibit excellent photoresponsive characteristics. However, the signals and their processing speed are often hindered by large low-frequency 1/f noise, necessitating an in-depth study of 1/f noise for effective realization and commercialization. Here, we report the optoelectronic response and 1/f noise characteristics of a p-n diode fabricated using the topological insulator Bi2Se3 and silicon for potential photodetector applications. Through meticulous temperature-dependent current–voltage (I–V) and capacitance–voltage (C–V) measurements, we ascertain crucial parameters such as barrier height, ideality factor, and reverse saturation current of the photodetector. The low-frequency 1/f conductance noise spectra suggest a significant presence of trap states influencing the optoelectronic transport properties. The forward noise characteristics exhibit typical 1/f features, with a unislope across four decades of frequency, suggesting a homogeneous distribution of barrier height. The detector photocurrent exhibits sublinear power-law scaling with laser power, which pertains to recombination effects and topological surface states. The hybrid heterojunction demonstrates an excellent photoresponse and reasonably low 1/f noise, making it promising for room-temperature visible photodetector applications.
期刊介绍:
ACS Applied Materials & Interfaces is a leading interdisciplinary journal that brings together chemists, engineers, physicists, and biologists to explore the development and utilization of newly-discovered materials and interfacial processes for specific applications. Our journal has experienced remarkable growth since its establishment in 2009, both in terms of the number of articles published and the impact of the research showcased. We are proud to foster a truly global community, with the majority of published articles originating from outside the United States, reflecting the rapid growth of applied research worldwide.