New Efficient D-π-A and A-π-A Structured Type I Radical Photoinitiators for Additive Manufacturing Nanomaterials Preparation (Adv. Mater. Technol. 12/2025)

IF 6.4 3区材料科学 Q1 MATERIALS SCIENCE, MULTIDISCIPLINARY

Advanced Materials Technologies Pub Date : 2025-06-17 DOI:10.1002/admt.202570067

Andrzej Świeży, Filip Petko, Dominika Krok-Janiszewska, Patryk Szymaszek, Mariusz Galek, Joanna Ortyl

引用次数: 0

Abstract

Additive Manufacturing Nanomaterials Preparation

In article number 2402139, Joanna Ortyl and co-workers present novel type I radical photoinitiators with extended conjugation systems that exhibit significantly redshifted absorption, enabling photoinitiation deep in visible light. This novel structural design allows for the creation of an entire library of new compounds for use in photopolymerization processes. Due to their excellent photoinitiating performance, these compounds are suitable for applications in vat 3D printing.

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用于增材制造纳米材料制备的新型高效D-π-A和A-π-A结构I型自由基光引发剂抛光工艺。12/2025)

在2402139号文章中，Joanna Ortyl及其同事提出了新型I型自由基光引发剂，其扩展共轭体系表现出明显的红移吸收，使光引发在可见光深度。这种新颖的结构设计允许创建用于光聚合过程的整个新化合物库。由于其优异的光引发性能，这些化合物适合应用于vat 3D打印。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

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来源期刊

Advanced Materials Technologies Materials Science-General Materials Science

CiteScore

10.20

自引率

4.40%

发文量

566

期刊介绍： Advanced Materials Technologies Advanced Materials Technologies is the new home for all technology-related materials applications research, with particular focus on advanced device design, fabrication and integration, as well as new technologies based on novel materials. It bridges the gap between fundamental laboratory research and industry.