A novel intermittent mesa structure with an Rh reflective layer and sloped sidewalls for high-power DUV LEDs

IF 2.2 3区物理与天体物理 Q2 OPTICS

Optics Communications Pub Date : 2025-06-13 DOI:10.1016/j.optcom.2025.132105

Hao Xu , ZiYuan Liu , NaiXin Liu , Bing Wang , Tong Zhang , WeiLing Guo , Jie Sun , AoQi Fang , JiXin Liu

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引用次数: 0

Abstract

The light extraction efficiency (LEE) of deep ultraviolet light-emitting diodes (DUV-LEDs) can be effectively improved by reflecting photons to the substrate side of the device through the optical waveguide modulation technique on the sloped sidewall. In this paper, by choosing different mask materials and adjusting the mask thickness, the angles of the mesa sidewalls (30°, 45°, 70°) were precisely controlled during etching. We thoroughly analyzed the performance of devices with these varied sidewall angles through experimental measurements and simulations, elucidating the impact of mask material and thickness on sidewall angles. More importantly, this paper has introduced an intermittent mesa structure based on 45° sloped sidewalls, which is able to increase the sidewall area of the device while effectively guaranteeing the integrity of the mesa. Meanwhile, the device used Ni/Rh/Ti as both p electrode and sidewall reflective layer, and the prepared devices show excellent performance with a radiant flux of 183.98 mW (@500 mA) and a wall-pull efficiency (WPE) of 7.33 % (@250 mA).

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一种具有Rh反射层和倾斜侧壁的新型间歇台面结构，用于大功率DUV led

深紫外发光二极管（duv - led）的光提取效率可以通过在器件倾斜侧壁上的光波导调制技术将光子反射到器件的衬底侧，从而有效提高器件的光提取效率。本文通过选择不同的掩模材料和调整掩模厚度，精确控制了蚀刻过程中台面侧壁的角度（30°、45°、70°）。我们通过实验测量和模拟，深入分析了这些不同侧壁角的器件性能，阐明了掩膜材料和厚度对侧壁角的影响。更重要的是，本文引入了一种基于45°倾斜侧壁的间歇台面结构，在增加设备侧壁面积的同时有效保证了台面的完整性。同时，该器件采用Ni/Rh/Ti作为p电极和侧壁反射层，其辐射通量为183.98 mW (@500 mA)，壁拉效率（WPE）为7.33% （@250 mA）。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

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来源期刊

Optics Communications 物理-光学

CiteScore

5.10

自引率

8.30%

发文量

681

审稿时长

38 days

期刊介绍： Optics Communications invites original and timely contributions containing new results in various fields of optics and photonics. The journal considers theoretical and experimental research in areas ranging from the fundamental properties of light to technological applications. Topics covered include classical and quantum optics, optical physics and light-matter interactions, lasers, imaging, guided-wave optics and optical information processing. Manuscripts should offer clear evidence of novelty and significance. Papers concentrating on mathematical and computational issues, with limited connection to optics, are not suitable for publication in the Journal. Similarly, small technical advances, or papers concerned only with engineering applications or issues of materials science fall outside the journal scope.