Generative resolution-enhanced microscopy based on computational stitching of Fourier spectra

IF 2.2 3区 工程技术 Q1 MICROSCOPY
E. Stai , V. Constantoudis , A. Kaidatzis , V. Singh , M.K. Tiwari , E. Gogolides
{"title":"Generative resolution-enhanced microscopy based on computational stitching of Fourier spectra","authors":"E. Stai ,&nbsp;V. Constantoudis ,&nbsp;A. Kaidatzis ,&nbsp;V. Singh ,&nbsp;M.K. Tiwari ,&nbsp;E. Gogolides","doi":"10.1016/j.micron.2025.103867","DOIUrl":null,"url":null,"abstract":"<div><div>Scanning Microscopies such as Atomic Force Microscopy (AFM) and Scanning Electron Microscopy (SEM) are widely used in nanotechnology to display (<span><span>Kalinin et al., 2023</span></span>) and quantify surface nanoroughness. However, their measurements suffer from scale and spatial limitations which hinder their full exploitation in the optimization of nanostructure fabrication and performance. The aim of this work is to overcome these limitations by proposing a computational method which enables the generation of multiple surface measurements (overcome spatial limitation) with enhanced scale content and increased resolution (overcome scale limitation) successfully mimicking the real surfaces. The method exploits the benefits of Fourier transform and is easily implemented based on Fourier spectra stitching. It can provide astonishing increase of resolution (&gt;10 times) in a large variety of image textures and, is fast with no requirements for training with large data sets. The so-called generative Fourier Spectra Stitching (gFSS) method is validated in synthesized rough surfaces and applied in real experimental AFM and SEM images of magnetic and metal surfaces with very promising results.</div></div>","PeriodicalId":18501,"journal":{"name":"Micron","volume":"196 ","pages":"Article 103867"},"PeriodicalIF":2.2000,"publicationDate":"2025-06-14","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Micron","FirstCategoryId":"5","ListUrlMain":"https://www.sciencedirect.com/science/article/pii/S096843282500085X","RegionNum":3,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q1","JCRName":"MICROSCOPY","Score":null,"Total":0}
引用次数: 0

Abstract

Scanning Microscopies such as Atomic Force Microscopy (AFM) and Scanning Electron Microscopy (SEM) are widely used in nanotechnology to display (Kalinin et al., 2023) and quantify surface nanoroughness. However, their measurements suffer from scale and spatial limitations which hinder their full exploitation in the optimization of nanostructure fabrication and performance. The aim of this work is to overcome these limitations by proposing a computational method which enables the generation of multiple surface measurements (overcome spatial limitation) with enhanced scale content and increased resolution (overcome scale limitation) successfully mimicking the real surfaces. The method exploits the benefits of Fourier transform and is easily implemented based on Fourier spectra stitching. It can provide astonishing increase of resolution (>10 times) in a large variety of image textures and, is fast with no requirements for training with large data sets. The so-called generative Fourier Spectra Stitching (gFSS) method is validated in synthesized rough surfaces and applied in real experimental AFM and SEM images of magnetic and metal surfaces with very promising results.
基于傅立叶光谱计算拼接的生成分辨率增强显微镜
扫描显微镜如原子力显微镜(AFM)和扫描电子显微镜(SEM)在纳米技术中被广泛用于显示(Kalinin et al., 2023)和量化表面纳米粗糙度。然而,它们的测量受到尺度和空间的限制,阻碍了它们在纳米结构制造和性能优化方面的充分利用。这项工作的目的是通过提出一种计算方法来克服这些限制,该方法能够生成多个表面测量值(克服空间限制),具有增强的尺度含量和提高的分辨率(克服尺度限制),成功地模拟真实表面。该方法利用了傅里叶变换的优点,且基于傅里叶谱拼接的方法易于实现。它可以在各种各样的图像纹理中提供惊人的分辨率提高(10倍),并且速度很快,不需要使用大型数据集进行训练。生成式傅立叶谱拼接(gFSS)方法在合成粗糙表面上得到了验证,并应用于磁性和金属表面的AFM和SEM实验图像中,取得了很好的效果。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
求助全文
约1分钟内获得全文 求助全文
来源期刊
Micron
Micron 工程技术-显微镜技术
CiteScore
4.30
自引率
4.20%
发文量
100
审稿时长
31 days
期刊介绍: Micron is an interdisciplinary forum for all work that involves new applications of microscopy or where advanced microscopy plays a central role. The journal will publish on the design, methods, application, practice or theory of microscopy and microanalysis, including reports on optical, electron-beam, X-ray microtomography, and scanning-probe systems. It also aims at the regular publication of review papers, short communications, as well as thematic issues on contemporary developments in microscopy and microanalysis. The journal embraces original research in which microscopy has contributed significantly to knowledge in biology, life science, nanoscience and nanotechnology, materials science and engineering.
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
确定
请完成安全验证×
copy
已复制链接
快去分享给好友吧!
我知道了
右上角分享
点击右上角分享
0
联系我们:info@booksci.cn Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。 Copyright © 2023 布克学术 All rights reserved.
京ICP备2023020795号-1
ghs 京公网安备 11010802042870号
Book学术文献互助
Book学术文献互助群
群 号:604180095
Book学术官方微信